C08G73/24

Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component

Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): ##STR00001##
wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X.sup.1 to X.sup.3 represent any of —CO.sub.2—, —CONR.sup.X1—, —O—, —NR.sup.X1—, —S—, —SO.sub.2—, —SO.sub.3— and —SO.sub.2NR.sup.X1— and may be the same as or different from each other, provided that R.sup.X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L.sup.1 and L.sup.2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT

Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1):

##STR00001##

wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X.sup.1 to X.sup.3 represent any of —CO.sub.2—, —CONR.sup.X1—, —O—, —NR.sup.X1—, —S—, —SO.sub.2—, —SO.sub.3— and —SO.sub.2NR.sup.X1— and may be the same as or different from each other, provided that R.sup.X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L.sup.1 and L.sup.2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

Phthalonitrile-based resin with improved impact strength

Provided is a phthalonitrile-based resin, comprising repeat units formed by the reaction of a phthalonitrile compound and a curing agent, wherein the phthalonitrile compound comprises 4,4-bis(3,4-dicyanophenoxy)diphenyloxide of the following Chemical Formula 1 and 4,4-bis(3,4-dicyanophenoxy)biphenyl of the following Chemical Formula 2 at a weight ratio of 30:70 to 90:10: ##STR00001##

Polymer and dispersion

A polymer is disclosed, which includes a structure of Formula 1 or Formula 2. ##STR00001##
R.sup.1 is a C.sub.2-18 alkylene group or a C.sub.6-18 arylene group, R.sup.2 is a C.sub.1-18 alkyl group, and R.sup.3 is a functional group of Formula 3. ##STR00002##
Each of X.sup.1, X.sup.2, X.sup.3, X.sup.4, X.sup.5, and X.sup.6, being the same or different, is H or methyl. Each of p, q, and r, being the same or different, is an integer of 1 to 60. R.sup.4 is C.sub.2H.sub.4, C.sub.3H.sub.6, ##STR00003##
Each of m and n, being the same or different, is an integer of 0 to 50, and m+n0.

Collectors for flotation process

The present invention relates to the flotation of non-sulfidic minerals and ores. Particularly the present invention relates to a collector for the beneficiation of non-sulfidic minerals and ores.