The invention provides methods for making substantially monodisperse populations of substantially spherical particles of polyarylketone polymers or of thio-analogues of such polymers, of selected sizes. Populations of such particles can be used, for example, to form porous devices with greater control of porosity than previously available. In some embodiments, the porous devices are frits, filters, membranes or monoliths.

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

Structural adhesive films are presented which comprise branched or networked polymers which are the reaction product of one or more polyether sulfone polymers, which may include amine-terminated polyether sulfone polymers and/or hydroxy-terminated polyether sulfone polymers, with epoxy-functional chemical species including the reaction product of one or more first polyepoxides with an amine-terminated branched polytetrahydrofuran polymer. The structural adhesive films may possess high strength, holding power and durability in high-temperature applications.

The present invention relates to copolymers comprising moieties able to undergo a crosslinking reaction under certain stimuli, thereby forming polymer adducts having improved or additional properties, such as resistance to solvents, increased thermal performance and increased adhesion to surfaces.

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

A method for producing an aromatic polysulfone by a polycondensation reaction between an aromatic dihalogenosulfone compound and an aromatic dihydroxy compound is described. The polycondensation reaction is performed in the presence of at least one aromatic end-capping agent; and an amount, p mol, of the aromatic dihalogenosulfone compound, an amount, q mol, of the aromatic dihydroxy compound, and an amount, r mol, of the aromatic end-capping agent have a relationship satisfying formula (S1) below and formula (S2) below:
r/(p−q)<2   (S1), and
p>q   (S2).

A method for producing an aromatic polysulfone by a polycondensation reaction between an aromatic dihalogenosulfone compound and an aromatic dihydroxy compound is described. The polycondensation reaction is performed in the presence of at least one aromatic end-capping agent; and an amount, p mol, of the aromatic dihalogenosulfone compound, an amount, q mol, of the aromatic dihydroxy compound, and an amount, r mol, of the aromatic end-capping agent have a relationship satisfying formula (S1) below and formula (S2) below:
r/(p−q)<2   (S1), and
p>q   (S2).

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

A flame-retarded resin includes at least one resin for which flame retardant capability is desired and at least one triaryl silicon-containing compound (I) as flame retardant in admixture therewith and/or chemically bonded, e.g., grafted, to the resin.