C08G75/30

Vinyl sulfonyl agents for thiol-ene polymerization and related uses
11708459 · 2023-07-25 · ·

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

Vinyl sulfonyl agents for thiol-ene polymerization and related uses
11708459 · 2023-07-25 · ·

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

THIOCARBONYL-BASED POLY(O-THIOCARBAMATE) COMPOUND AND PREPARATION METHOD AND USE THEREOF
20230002559 · 2023-01-05 ·

The present disclosure discloses a thiocarbonyl-based poly(O-thiocarbamate) compound and a preparation method and use thereof, belonging to the technical field of polymer chemistry and material science. The present disclosure provides a new thiocarbonyl-based poly(O-thiocarbamate)compound with a structure represented by Formula I, which has sulfur element introduced, and has good solubility and high molecular weight. The thiocarbonyl-based poly(O-thiocarbamate) compound provided has good thermal stability and a very high refractive index, and is expected to have desirable applications in the optical field.

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VINYL SULFONYL AGENTS FOR THIOL-ENE POLYMERIZATION AND RELATED USES
20230132021 · 2023-04-27 ·

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

VINYL SULFONYL AGENTS FOR THIOL-ENE POLYMERIZATION AND RELATED USES
20230132021 · 2023-04-27 ·

The present disclosure relates to combinations, build materials, and kits containing vinyl sulfonyl agents for thiol-ene polymerization. The present disclosure also relates to uses of the combinations, materials, and kits, e.g., in 3D printing.

Single-ion polymer electrolyte molecular design

A single-ion polymer electrolyte has formula (I): R—[SO.sub.2N(M)SO.sub.2—X—].sub.m—SO.sub.3Li (I). In formula (I), X may be an electron withdrawing group such as an aromatic group, substituted aromatic group, —(CF.sub.2).sub.n—, —(CCl.sub.2).sub.n—, —C.sub.6H.sub.4—, or —C.sub.6H.sub.3(NO.sub.2)—. R may be a fluorinated alkyl, LiSO.sub.3(CF.sub.2).sub.3—, or an aromatic group, and M may be a metal cation. For the single-ion polymer electrolyte with formula (I), m may be an integer from 2 to 2000, and n may be an integer from 1 to 4.

Single-ion polymer electrolyte molecular design

A single-ion polymer electrolyte has formula (I): R—[SO.sub.2N(M)SO.sub.2—X—].sub.m—SO.sub.3Li (I). In formula (I), X may be an electron withdrawing group such as an aromatic group, substituted aromatic group, —(CF.sub.2).sub.n—, —(CCl.sub.2).sub.n—, —C.sub.6H.sub.4—, or —C.sub.6H.sub.3(NO.sub.2)—. R may be a fluorinated alkyl, LiSO.sub.3(CF.sub.2).sub.3—, or an aromatic group, and M may be a metal cation. For the single-ion polymer electrolyte with formula (I), m may be an integer from 2 to 2000, and n may be an integer from 1 to 4.

PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND
20170329225 · 2017-11-16 ·

Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.

PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND
20170329225 · 2017-11-16 ·

Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.

Polysulfonamide Redistribution Compositions and Methods of Their Use
20170329222 · 2017-11-16 ·

The invention relates to polysulfonamide compositions for use as redistribution layers as used in the manufacture of semiconductors and semiconductor packages. More specifically it relates to photoimageable polysulfonamide composition for redistribution applications. The invention also relates to the use of the compositions in semiconductor manufacture.