The disclosure relates to sidechain functionalized organosiloxane compounds comprising polyalkyleneoxide (POA) and/or polyalkyleneoxide coupled zwitterionic moieties with various other modular side chains including reactive and or non-reactive groups. The present disclosure further also pertains to ice-phobic polymer formulations capable of curing on a substrate to form a surface that is ice-phobic, resistant to ice formation, and/or resistant to ice adhesion. The disclosed ice-phobic polymer formulations comprise one or more disclosed sidechain functionalized organosiloxane compound, one or more binder resin, and/or one or more lubricating liquid. The present disclosure further relates to articles comprising the disclosed ice-phobic polymer compositions, thereby providing articles having ice-phobic properties. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.

The disclosure relates to sidechain functionalized organosiloxane compounds comprising polyalkyleneoxide (POA) and/or polyalkyleneoxide coupled zwitterionic moieties with various other modular side chains including reactive and or non-reactive groups. The present disclosure further also pertains to ice-phobic polymer formulations capable of curing on a substrate to form a surface that is ice-phobic, resistant to ice formation, and/or resistant to ice adhesion. The disclosed ice-phobic polymer formulations comprise one or more disclosed sidechain functionalized organosiloxane compound, one or more binder resin, and/or one or more lubricating liquid. The present disclosure further relates to articles comprising the disclosed ice-phobic polymer compositions, thereby providing articles having ice-phobic properties. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.

A modified polysiloxane has formula (I) ##STR00001##
In formula (I) m is an integer between 0 and 10000; n is an integer between 0 and 10000; m and n cannot be equal to 0 simultaneously; R.sub.1-R.sub.7 are the same or different; and at least one of R.sub.1-R.sub.7 includes a group having a reversible chemical bond system based on a hydrogen bond, a coordinate bond, or a covalent bond. The polysioxane is used as a main chain to introduce a reversible chemical bond having temperature sensitivity by using a chemical method, so as to obtain a polymer material which is highly sensitive to temperature. The temperature-sensitive properties of materials provide functional materials for specific applications, such as medical external fixation materials, orthopedic materials, and packaging materials, can be obtained by using particular processing and preparation methods.

A modified polysiloxane has formula (I) ##STR00001##
In formula (I) m is an integer between 0 and 10000; n is an integer between 0 and 10000; m and n cannot be equal to 0 simultaneously; R.sub.1-R.sub.7 are the same or different; and at least one of R.sub.1-R.sub.7 includes a group having a reversible chemical bond system based on a hydrogen bond, a coordinate bond, or a covalent bond. The polysioxane is used as a main chain to introduce a reversible chemical bond having temperature sensitivity by using a chemical method, so as to obtain a polymer material which is highly sensitive to temperature. The temperature-sensitive properties of materials provide functional materials for specific applications, such as medical external fixation materials, orthopedic materials, and packaging materials, can be obtained by using particular processing and preparation methods.

The phosphorylcholine group-containing polysiloxane monomer of the present invention is represented by the formula (1). In the formula, a represents an integer of 20 to 500, b represents an integer of 1 to 70, c represents an integer of 1 to 70, d represents 0 or 1, p and q each represent 0 or 1, X represents —CH.sub.2— or —CH.sub.2CH.sub.2—, and R represents an alkyl group having 2 to 18 carbon atoms. The present invention provides the phosphorylcholine group-containing polysiloxane monomer which gives, when copolymerized with a polymerizable monomer such as methacrylic acid or a hydrophilic monomer other than methacrylic acid, a polymer that exhibits surface hydrophilicity and sufficient stability as ophthalmic devices.

The phosphorylcholine group-containing polysiloxane monomer of the present invention is represented by the formula (1). In the formula, a represents an integer of 20 to 500, b represents an integer of 1 to 70, c represents an integer of 1 to 70, d represents 0 or 1, p and q each represent 0 or 1, X represents —CH.sub.2— or —CH.sub.2CH.sub.2—, and R represents an alkyl group having 2 to 18 carbon atoms. The present invention provides the phosphorylcholine group-containing polysiloxane monomer which gives, when copolymerized with a polymerizable monomer such as methacrylic acid or a hydrophilic monomer other than methacrylic acid, a polymer that exhibits surface hydrophilicity and sufficient stability as ophthalmic devices.

A radiation-emitting component includes a radiation source; a transparent material disposed in the beam path of the component and including a polymer material and filler particles, wherein the filler particles include an inorganic filler material and a phosphonic acid derivative or phosphoric acid derivative attached to a surface thereof and through which the filler particles are crosslinked with the polymer material.

A radiation-emitting component includes a radiation source; a transparent material disposed in the beam path of the component and including a polymer material and filler particles, wherein the filler particles include an inorganic filler material and a phosphonic acid derivative or phosphoric acid derivative attached to a surface thereof and through which the filler particles are crosslinked with the polymer material.

A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.

A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.