The present disclosure provides a coated glass substrate, first and second coating compositions, and a process for coating the substrate. The first composition includes a source of tin, a source of fluorine, a source of titanium, and a solvent. The second composition includes a source of tin, a source of fluorine, and a solvent, and can be free of titanium. The first composition is applied to the substrate under elevated temperatures, and a first or sub layer is formed on the substrate via pyrolysis. The second composition is then applied, to form a second or top layer over the sub layer.

The present disclosure provides a coated glass substrate, first and second coating compositions, and a process for coating the substrate. The first composition includes a source of tin, a source of fluorine, a source of titanium, and a solvent. The second composition includes a source of tin, a source of fluorine, and a solvent, and can be free of titanium. The first composition is applied to the substrate under elevated temperatures, and a first or sub layer is formed on the substrate via pyrolysis. The second composition is then applied, to form a second or top layer over the sub layer.

A method for producing a composition containing low molecular weight polytetrafluoroethylene, the method including: (I) irradiating a composition containing high molecular weight polytetrafluoroethylene with ionizing radiation to obtain a composition containing low molecular weight polytetrafluoroethylene having a melt viscosity at 380° C. in the range of 1.0×10.sup.2 to 7.0×10.sup.5 Pa.Math.s; and (II) carrying out at least one selected from the group consisting of washing treatment, steam treatment and decompression treatment on the composition containing low molecular weight polytetrafluoroethylene.

A method for producing a composition containing low molecular weight polytetrafluoroethylene, the method including: (I) irradiating a composition containing high molecular weight polytetrafluoroethylene with ionizing radiation to obtain a composition containing low molecular weight polytetrafluoroethylene having a melt viscosity at 380° C. in the range of 1.0×10.sup.2 to 7.0×10.sup.5 Pa.Math.s; and (II) carrying out at least one selected from the group consisting of washing treatment, steam treatment and decompression treatment on the composition containing low molecular weight polytetrafluoroethylene.

A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C.sub.9-C.sub.25 aliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200° C.

A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C.sub.9-C.sub.25 aliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200° C.

A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C.sub.9-C.sub.25 aliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200° C.

Doped poly(2-vinylpyridine) which comprises 2 to 30 wt % of a dopant which is a C.sub.9-C.sub.25 aliphatic polycyclic compound.

Doped poly(2-vinylpyridine) which comprises 2 to 30 wt % of a dopant which is a C.sub.9-C.sub.25 aliphatic polycyclic compound.

Doped poly(2-vinylpyridine) which comprises 2 to 30 wt % of a dopant which is a C.sub.9-C.sub.25 aliphatic polycyclic compound.