The present disclosure provides a coated glass substrate, first and second coating compositions, and a process for coating the substrate. The first composition includes a source of tin, a source of fluorine, a source of titanium, and a solvent. The second composition includes a source of tin, a source of fluorine, and a solvent, and can be free of titanium. The first composition is applied to the substrate under elevated temperatures, and a first or sub layer is formed on the substrate via pyrolysis. The second composition is then applied, to form a second or top layer over the sub layer.

A method for producing a composition containing low molecular weight polytetrafluoroethylene, the method including: (I) irradiating a composition containing high molecular weight polytetrafluoroethylene with ionizing radiation to obtain a composition containing low molecular weight polytetrafluoroethylene having a melt viscosity at 380° C. in the range of 1.0×10.sup.2 to 7.0×10.sup.5 Pa.Math.s; and (II) decomposing a low molecular weight fluorine-containing compound contained in the composition containing low molecular weight polytetrafluoroethylene obtained above.

A method for producing a composition containing low molecular weight polytetrafluoroethylene, the method including: (I) irradiating a composition containing high molecular weight polytetrafluoroethylene with ionizing radiation to obtain a composition containing low molecular weight polytetrafluoroethylene having a melt viscosity at 380° C. in the range of 1.0×10.sup.2 to 7.0×10.sup.5 Pa.Math.s; and (II) decomposing a low molecular weight fluorine-containing compound contained in the composition containing low molecular weight polytetrafluoroethylene obtained above.

A method for producing a composition containing low molecular weight polytetrafluoroethylene, the method including: (I) irradiating a composition containing high molecular weight polytetrafluoroethylene with ionizing radiation to obtain a composition containing low molecular weight polytetrafluoroethylene having a melt viscosity at 380° C. in the range of 1.0×10.sup.2 to 7.0×10.sup.5 Pa.Math.s; and (II) decomposing a low molecular weight fluorine-containing compound contained in the composition containing low molecular weight polytetrafluoroethylene obtained above.

There is provided a curable composition for forming an anti-reflective film. The composition includes: (a) hollow silica nanoparticles; (b) a siloxane binder having reactive groups; (c) at least one additional material having reactive groups; (d) an initiator; and (e) solvent. The siloxane binder is present in an amount that is at least 50% by weight of the total weight of (siloxane binder+additional materials having reactive groups). The weight ratio of hollow silica nanoparticles to the total of (siloxane binder+additional materials having reactive groups) is no greater than 1.75 to 1.

There is provided a curable composition for forming an anti-reflective film. The composition includes: (a) hollow silica nanoparticles; (b) a siloxane binder having reactive groups; (c) at least one additional material having reactive groups; (d) an initiator; and (e) solvent. The siloxane binder is present in an amount that is at least 50% by weight of the total weight of (siloxane binder+additional materials having reactive groups). The weight ratio of hollow silica nanoparticles to the total of (siloxane binder+additional materials having reactive groups) is no greater than 1.75 to 1.

The xylylene diisocyanate composition according to exemplary examples includes xylylene diisocyanate (XDI), and an acidity adjusting agent having a boiling point of 110° C. or higher, wherein the composition has an acidity of more than 100 ppm and 1,000 ppm or less based on a total weight of xylylene diisocyanate (XDI). A polymerization reaction rate is controlled through regulation of the acidity so that an optical lens having high transmittance and improved optical uniformity may be manufactured.

The xylylene diisocyanate composition according to exemplary examples includes xylylene diisocyanate (XDI), and an acidity adjusting agent having a boiling point of 110° C. or higher, wherein the composition has an acidity of more than 100 ppm and 1,000 ppm or less based on a total weight of xylylene diisocyanate (XDI). A polymerization reaction rate is controlled through regulation of the acidity so that an optical lens having high transmittance and improved optical uniformity may be manufactured.

The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance. ##STR00001##

The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance. ##STR00001##