This invention generally provides composition for making a polyurethane foam with reduced aldehyde emission and more specially to composition useful in means of transport such as interior part of cars, wherein composition is comprising: (a) a polyfunctional isocyanate; (b) an isocyanate reactive composition; and (c) a compound of the formula (I) or (II), wherein the compound (c) is present by weight percentage in the composition in an amount ranging from about 0.001 to about 10, preferably from about 0.01 to about 5, and more preferably from about 0.05 to about 2 based on the total weight of the composition. The compositions can reduce aldehyde emission, especially acetaldehyde emission in the PU foam and has no obvious influence on the mechanic properties of the foam.

This invention generally provides composition for making a polyurethane foam with reduced aldehyde emission and more specially to composition useful in means of transport such as interior part of cars, wherein composition is comprising: (a) a polyfunctional isocyanate; (b) an isocyanate reactive composition; and (c) a compound of the formula (I) or (II), wherein the compound (c) is present by weight percentage in the composition in an amount ranging from about 0.001 to about 10, preferably from about 0.01 to about 5, and more preferably from about 0.05 to about 2 based on the total weight of the composition. The compositions can reduce aldehyde emission, especially acetaldehyde emission in the PU foam and has no obvious influence on the mechanic properties of the foam.

Provided is a varnish for the formation of a charge-transporting thin film, said varnish including an organic solvent, a charge-transporting substance, and a 2,2,6,6-tetraalkylpiperidine-N-oxyl derivative represented by formula (T1)

##STR00001##

(in the formula, each R.sup.A independently represents a C1-20 alkyl group, and R.sup.B represents a hydrogen atom, a hydroxy group, an amino group, a carboxyl group, a cyano group, an oxo group, an isocyanato group, a C1-20 alkoxy group, a C2-20 alkylcarbonyloxy group, a C7-20 arylcarbonyloxy group, a C2-20 alkylcarbonylamino group or a C7-20 arylcarbonylamino group).

Provided is a varnish for the formation of a charge-transporting thin film, said varnish including an organic solvent, a charge-transporting substance, and a 2,2,6,6-tetraalkylpiperidine-N-oxyl derivative represented by formula (T1)

##STR00001##

(in the formula, each R.sup.A independently represents a C1-20 alkyl group, and R.sup.B represents a hydrogen atom, a hydroxy group, an amino group, a carboxyl group, a cyano group, an oxo group, an isocyanato group, a C1-20 alkoxy group, a C2-20 alkylcarbonyloxy group, a C7-20 arylcarbonyloxy group, a C2-20 alkylcarbonylamino group or a C7-20 arylcarbonylamino group).

The present invention relates to flame-retardant moulding compositions comprising siloxane-containing polycarbonate block cocondensate, and also to a process for the production of these moulding compositions. The invention further relates to the use of these flame-retardant moulding compositions in injection-moulding and extrusion applications.

The present invention relates to flame-retardant moulding compositions comprising siloxane-containing polycarbonate block cocondensate, and also to a process for the production of these moulding compositions. The invention further relates to the use of these flame-retardant moulding compositions in injection-moulding and extrusion applications.

The present disclosure concerns foamed thermoplastic compositions exhibiting improved multi-axial impact strength. The foamed thermoplastic compositions can be employed in a number of requiring impact strength and flame performance.

The present disclosure concerns foamed thermoplastic compositions exhibiting improved multi-axial impact strength. The foamed thermoplastic compositions can be employed in a number of requiring impact strength and flame performance.

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##