C08L101/04

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Requirements 1 to 3, Requirement 1: The A value determined by Formula (1) is 0.14 or more,
A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula(1) Requirement 2: The concentration of solid contents in the photosensitive composition for EUV light is 5.0% by mass or less, Requirement 3: The content of the photoacid generator is 5% to 50% by mass with respect to the total solid content in the photosensitive composition for EUV light.

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Requirements 1 to 3, Requirement 1: The A value determined by Formula (1) is 0.14 or more,
A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula(1) Requirement 2: The concentration of solid contents in the photosensitive composition for EUV light is 5.0% by mass or less, Requirement 3: The content of the photoacid generator is 5% to 50% by mass with respect to the total solid content in the photosensitive composition for EUV light.

FLUORINE-CONTAINING CURABLE COMPOSITION AND ARTICLE

This fluorine-containing curable composition comprises a curable component (A) that provides a cured product under the effect of heat or moisture, and a surface-modifying component (B) that contains a perfluoropolyether compound (b1) having a prescribed structure. The perfluoropolyether compound (b1) in the surface-modifying component (B) is present at 0.005-50 mass parts per 100 mass parts of the curable component (A) excluding volatile components. The fluorine-containing curable composition can be cured by heat or moisture, can be coated on the surface of an article even not containing a fluorine-containing solvent, and can provide the cured product surface with excellent surface characteristics.

FLUORINE-CONTAINING CURABLE COMPOSITION AND ARTICLE

This fluorine-containing curable composition comprises a curable component (A) that provides a cured product under the effect of heat or moisture, and a surface-modifying component (B) that contains a perfluoropolyether compound (b1) having a prescribed structure. The perfluoropolyether compound (b1) in the surface-modifying component (B) is present at 0.005-50 mass parts per 100 mass parts of the curable component (A) excluding volatile components. The fluorine-containing curable composition can be cured by heat or moisture, can be coated on the surface of an article even not containing a fluorine-containing solvent, and can provide the cured product surface with excellent surface characteristics.

Resin composition and method of forming resist pattern

A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.

Resin composition and method of forming resist pattern

A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.

METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
20170355853 · 2017-12-14 ·

The present invention provides a method for manufacturing a liquid crystal display device which requires a reduced light irradiation dose in the alignment treatment for a photo-alignment film and achieves a favorable contrast ratio and a viewing angle property. The method for manufacturing a liquid crystal display device includes, in the following order, the steps of: (1) forming on a substrate a film of a photo-alignment film material containing two or more polymers and a solvent; (2) pre-baking the film to evaporate the solvent; (3) post-baking the pre-baked film gradually at multiple temperatures from a low temperature to a high temperature; and (4) irradiating the post-baked film with polarized light, at least one of the two or more polymers being a photo-reactive polymer containing a photo-functional group in a side chain.

METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
20170355853 · 2017-12-14 ·

The present invention provides a method for manufacturing a liquid crystal display device which requires a reduced light irradiation dose in the alignment treatment for a photo-alignment film and achieves a favorable contrast ratio and a viewing angle property. The method for manufacturing a liquid crystal display device includes, in the following order, the steps of: (1) forming on a substrate a film of a photo-alignment film material containing two or more polymers and a solvent; (2) pre-baking the film to evaporate the solvent; (3) post-baking the pre-baked film gradually at multiple temperatures from a low temperature to a high temperature; and (4) irradiating the post-baked film with polarized light, at least one of the two or more polymers being a photo-reactive polymer containing a photo-functional group in a side chain.

Coating material composition, and light-diffusing member manufactured using said coating material composition

A coating material composition include a hydroxyl group-containing acrylic resin, a fluororesin, and light diffusive particles, and the hydroxyl group-containing acrylic resin has a weight-average molecular weight in a range of 10,000 to 30,000 and a hydroxyl value in a range of 14 to 70, wherein a mass ratio of the fluororesin to the hydroxyl group-containing acrylic resin (the fluororesin/the hydroxyl group-containing acrylic resin) is in a range of 5/95 to 50/50. The coating material composition can provide the light diffusing properties capable of uniformly diffusing light while effectively masking a light source image.

Coating material composition, and light-diffusing member manufactured using said coating material composition

A coating material composition include a hydroxyl group-containing acrylic resin, a fluororesin, and light diffusive particles, and the hydroxyl group-containing acrylic resin has a weight-average molecular weight in a range of 10,000 to 30,000 and a hydroxyl value in a range of 14 to 70, wherein a mass ratio of the fluororesin to the hydroxyl group-containing acrylic resin (the fluororesin/the hydroxyl group-containing acrylic resin) is in a range of 5/95 to 50/50. The coating material composition can provide the light diffusing properties capable of uniformly diffusing light while effectively masking a light source image.