C08L27/04

DISPERSION

A dispersion containing a fluorine-containing polymer and a liquid medium. The fluorine-containing polymer includes a repeating unit derived from a fluorine-containing monomer (a) having a Q value of 2.0 or more and comprising a fluoroalkyl group, and a repeating unit derived from a chloride monomer (b) that is at least one selected from vinyl chloride and vinylidene chloride. Further, the dispersion has a concentration of unreacted chloride monomer (b) of 2.0 ppm or less.

POST-PROCESSING APPARATUS

The present invention relates to a post-processing apparatus configured to post-process latex, the post-processing apparatus including: a receiving tank having therein a receiving part and having an inlet port through which the latex is introduced into the receiving part and a discharge port through which the latex is discharged; an ultrasonic wave generating device configured to generate ultrasonic waves to the latex accommodated in the receiving tank; a pressure reducing part configured to reduce a pressure of the receiving part of the receiving tank to discharge an unreacted monomer to the outside of the receiving tank; and a partition part provided in the receiving part of the receiving tank and comprising a plurality of partitions disposed in a direction from the inlet port toward the discharge port of the receiving tank, in which the latex accommodated in the receiving part moves along upper and lower sides of the plurality of partitions.

POST-PROCESSING APPARATUS

The present invention relates to a post-processing apparatus configured to post-process latex, the post-processing apparatus including: a receiving tank having therein a receiving part and having an inlet port through which the latex is introduced into the receiving part and a discharge port through which the latex is discharged; an ultrasonic wave generating device configured to generate ultrasonic waves to the latex accommodated in the receiving tank; a pressure reducing part configured to reduce a pressure of the receiving part of the receiving tank to discharge an unreacted monomer to the outside of the receiving tank; and a partition part provided in the receiving part of the receiving tank and comprising a plurality of partitions disposed in a direction from the inlet port toward the discharge port of the receiving tank, in which the latex accommodated in the receiving part moves along upper and lower sides of the plurality of partitions.

THERMOPLASTIC COMPOSITE MATERIALS

Composite materials are described herein. The composite materials include a polymer matrix comprising at least one fluorinated homo- or copolymer and continuous fibers dispersed within the polymer matrix. The continuous fibers are present within the composite material in an amount between about 10 wt % and about 90 wt % of a weight of the composite material. The composite materials also include a filler dispersed within the polymer matrix. The filler is present within the composite material in an amount between about 5 wt % and about 25 wt % of an amount of the polymer matrix.

THERMOPLASTIC COMPOSITE MATERIALS

Composite materials are described herein. The composite materials include a polymer matrix comprising at least one fluorinated homo- or copolymer and continuous fibers dispersed within the polymer matrix. The continuous fibers are present within the composite material in an amount between about 10 wt % and about 90 wt % of a weight of the composite material. The composite materials also include a filler dispersed within the polymer matrix. The filler is present within the composite material in an amount between about 5 wt % and about 25 wt % of an amount of the polymer matrix.

Chloroprene rubber latex adhesive composition

Provided is a chloroprene rubber latex adhesive composition superior in initial adhesive strength and normal adhesive strength and also in thermal creep resistance with adherend. A chloroprene rubber latex adhesive composition includes a carboxy-modified chloroprene-based copolymer latex (A) containing a copolymer of chloroprene monomer and an ethylenic unsaturated carboxylic acid and a polyvinylalcohol, a chloroprene-based polymer latex (B) containing a chloroprene homopolymer or a copolymer of chloroprene monomer and other monomer and a rosin acid metal salt and a chlorinated polyolefin resin emulsion (C), wherein the content ratio of the carboxy-modified chloroprene-based copolymer latex (A) to the chloroprene-based polymer latex (B) is 80:20 to 20:80 as solid matter.

Chloroprene rubber latex adhesive composition

Provided is a chloroprene rubber latex adhesive composition superior in initial adhesive strength and normal adhesive strength and also in thermal creep resistance with adherend. A chloroprene rubber latex adhesive composition includes a carboxy-modified chloroprene-based copolymer latex (A) containing a copolymer of chloroprene monomer and an ethylenic unsaturated carboxylic acid and a polyvinylalcohol, a chloroprene-based polymer latex (B) containing a chloroprene homopolymer or a copolymer of chloroprene monomer and other monomer and a rosin acid metal salt and a chlorinated polyolefin resin emulsion (C), wherein the content ratio of the carboxy-modified chloroprene-based copolymer latex (A) to the chloroprene-based polymer latex (B) is 80:20 to 20:80 as solid matter.

Polymer, positive resist composition, and method of forming resist pattern
11644752 · 2023-05-09 · ·

Provided is a polymer that when used as a main chain scission-type positive resist, can sufficiently inhibit resist pattern collapse, can favorably form a clear resist pattern, and can also improve sensitivity. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below. [In formula (I), R.sup.1 is an organic group including not fewer than 5 and not more than 7 fluorine atoms. In formula (II), R.sup.2 is a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of not less than 0 and not more than 5, and p+q=5.] ##STR00001##

Polymer, positive resist composition, and method of forming resist pattern
11644752 · 2023-05-09 · ·

Provided is a polymer that when used as a main chain scission-type positive resist, can sufficiently inhibit resist pattern collapse, can favorably form a clear resist pattern, and can also improve sensitivity. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below. [In formula (I), R.sup.1 is an organic group including not fewer than 5 and not more than 7 fluorine atoms. In formula (II), R.sup.2 is a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of not less than 0 and not more than 5, and p+q=5.] ##STR00001##

Impact Strength Modifier for Chlorine-Containing Resin, Chlorine-Containing Resin Composition and Molded Body of Chlorine-Containing Resin Composition

Disclosed is an impact strength modifier (α) for a chlorine-containing resin, comprising a powder of a graft copolymer (A) obtained by graft polymerizing one or more kinds of vinyl monomers (b1) onto a polyorganosiloxane rubber (A1) or a composite rubber (A2) containing a polyorganosiloxane rubber and a polyalkyl (meth)acrylate rubber, wherein the specific surface area of the powder of the graft copolymer (A) measured by a nitrogen gas adsorption method is from 0.6 to 30 m.sup.2/g, and the pH of water used for extraction under conditions, in which (1) in an oven at 180° C., 5.0 g of the powder of the graft copolymer (A) is left to stand still and heated for 15 minutes, and (2) after the heating, the powder is dispersed in 100 ml of heated pure water and extracted for 1 hour at 70° C. while stirring, is from 4 to 11.