Patent classifications
C09C1/06
PIGMENT TREATED WITH AT LEAST ONE NON-REACTIVE POLYSILOXANE FOR USE IN THERMOPLASTICS
An inorganic pigment which is treated with at least one non-reactive polysiloxane of the general Formula I
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In general Formula I, R.sup.1 to R.sup.8 are the same or different and are selected from C.sub.mH.sub.2m+1, wherein m is ≤10, and fluorinated derivatives thereof wherein at least one hydrogen atom is replaced by fluorine, C.sub.6H.sub.5, and (EO).sub.x(PO).sub.y and copolymers thereof, wherein EO is an oxyethylene unit, PO is an oxypropylene unit, x and y are the same or different, and x+y is in the range of 1 to 50. The at least one non-reactive polysiloxane has a viscosity in the range of 50-3000 mm.sup.2×s.sup.−1 at 25° C. The inorganic pigment treated with the at least one non-reactive polysiloxane of general Formula I has a residual moisture content of less than 1 wt-%.
Composition and method for polishing memory hard disks
The invention provides a chemical-mechanical polishing composition containing aluminate-modified silica particles, a polyacrylamide, a heterocyclic film-forming agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
Composition and method for polishing memory hard disks
The invention provides a chemical-mechanical polishing composition containing aluminate-modified silica particles, a polyacrylamide, a heterocyclic film-forming agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
Surface treatment of particles and their use
Surface treatment of titanium dioxide, barium sulfate, zinc sulfide, and/or lithopone particles, and mixtures of said particles with specific alkoxylated siloxanes for the improvement of dispersion in plastics.
Surface treatment of particles and their use
Surface treatment of titanium dioxide, barium sulfate, zinc sulfide, and/or lithopone particles, and mixtures of said particles with specific alkoxylated siloxanes for the improvement of dispersion in plastics.
Method for treating the surface of particles, the thus obtained particles and use thereof
A method for producing surface-treated particles includes surface treatment of titanium dioxide, barium sulfate, zinc sulfide or lithopone particles, and to mixtures of the particles with alkoxylated siloxanes and phthalate-free plasticizers for improving dispersion in plastics.
Method for treating the surface of particles, the thus obtained particles and use thereof
A method for producing surface-treated particles includes surface treatment of titanium dioxide, barium sulfate, zinc sulfide or lithopone particles, and to mixtures of the particles with alkoxylated siloxanes and phthalate-free plasticizers for improving dispersion in plastics.
SURFACE TREATMENT OF PARTICLES AND THEIR USE
Surface treatment of titanium dioxide, barium sulfate, zinc sulfide, and/or lithopone particles, and mixtures of said particles with specific alkoxylated siloxanes for the improvement of dispersion in plastics.
SURFACE TREATMENT OF PARTICLES AND THEIR USE
Surface treatment of titanium dioxide, barium sulfate, zinc sulfide, and/or lithopone particles, and mixtures of said particles with specific alkoxylated siloxanes for the improvement of dispersion in plastics.