A surface functionalizing method for use in high-throughput in situ synthesis of nucleic acids by 3D inkjet printing. The method includes subjecting a surface of a substrate to hydroxyl enrichment treatment; adding hydrophobic molecules to the surface of the substrate, the hydrophobic molecules being not reactive with phosphoramidite monomers; spraying, by a multi-channel piezoelectric inkjet head assembly, an etching ink to a predetermined area on the surface of the substrate for micro-etching, the etching ink being prepared with a fluoride compound reactive with the hydrophobic molecules; and adding hydrophilic molecules to the surface of the substrate. By using the method, a functionalized surface with given areas being patterned can be formed on the surface of the substrate, and then a same multi-channel piezoelectric inkjet head assembly can be directly used for subsequent high-resolution printing of phosphoramidite monomers and synthesis of nucleic acids.

A surface functionalizing method for use in high-throughput in situ synthesis of nucleic acids by 3D inkjet printing. The method includes subjecting a surface of a substrate to hydroxyl enrichment treatment; adding hydrophobic molecules to the surface of the substrate, the hydrophobic molecules being not reactive with phosphoramidite monomers; spraying, by a multi-channel piezoelectric inkjet head assembly, an etching ink to a predetermined area on the surface of the substrate for micro-etching, the etching ink being prepared with a fluoride compound reactive with the hydrophobic molecules; and adding hydrophilic molecules to the surface of the substrate. By using the method, a functionalized surface with given areas being patterned can be formed on the surface of the substrate, and then a same multi-channel piezoelectric inkjet head assembly can be directly used for subsequent high-resolution printing of phosphoramidite monomers and synthesis of nucleic acids.

Silicon particles with a reduced and/or delayed propensity to generate hydrogen gas by reaction with water in aqueous inks for preparing lithium ion battery anodes are prepared by milling silicon, preferably in an oxidative atmosphere, followed by heat treating at an elevated temperature in vacuum or an inert atmosphere.

Silicon particles with a reduced and/or delayed propensity to generate hydrogen gas by reaction with water in aqueous inks for preparing lithium ion battery anodes are prepared by milling silicon, preferably in an oxidative atmosphere, followed by heat treating at an elevated temperature in vacuum or an inert atmosphere.

Provided are semiconductor particles including a Group 12-16 semiconductor including a Group 12 element and a Group 16 element, a Group 13-15 semiconductor including a Group 13 element and a Group 15 element, or a Group 14 semiconductor including a Group 14 element, the semiconductor particles having a plasma frequency of 1.7×10.sup.14 rad/s to 4.7×10.sup.14 rad/s and a maximum length of 1 nm to 2,000 nm; and a dispersion, a film, an optical filter, a building member, or a radiant cooling device, in all of which the semiconductor particles are used.

Provided are semiconductor particles including a Group 12-16 semiconductor including a Group 12 element and a Group 16 element, a Group 13-15 semiconductor including a Group 13 element and a Group 15 element, or a Group 14 semiconductor including a Group 14 element, the semiconductor particles having a plasma frequency of 1.7×10.sup.14 rad/s to 4.7×10.sup.14 rad/s and a maximum length of 1 nm to 2,000 nm; and a dispersion, a film, an optical filter, a building member, or a radiant cooling device, in all of which the semiconductor particles are used.

Aqueous coating compositions providing enhanced anticorrosive and water-resistant properties. The anticorrosive coating comprises water borne resin, surface-hydrophobic inorganic pigments, and/or surface-hydrophobic inorganic extenders.

Aqueous coating compositions providing enhanced anticorrosive and water-resistant properties. The anticorrosive coating comprises water borne resin, surface-hydrophobic inorganic pigments, and/or surface-hydrophobic inorganic extenders.

Silica-based hydrophobic granular material with an increased polarity Silica-based granular material, comprising silica and at least one IR-opacifier, hydrophobized with a surface treatment agent comprising a silicon atom, wherein the granular material has: a) a cumulative pore volume of pores>4 nm of more than 2.5 cm.sup.3/g, as determined by the mercury intrusion method according to DIN ISO 15901-1; b) a tamped density of 140 g/L to 290 g/L; c) a number of silanol groups relative to BET surface area d.sub.SiOH of at least 0.5 SiOH/nm.sup.2, as determined by reaction with lithium aluminium hydride. d) a number of silicon atoms in the surface treatment agent relative to BET surface area d.sub.[Si] of at least 1.0 [Si atoms]/nm.sup.2.

Silica-based hydrophobic granular material with an increased polarity Silica-based granular material, comprising silica and at least one IR-opacifier, hydrophobized with a surface treatment agent comprising a silicon atom, wherein the granular material has: a) a cumulative pore volume of pores>4 nm of more than 2.5 cm.sup.3/g, as determined by the mercury intrusion method according to DIN ISO 15901-1; b) a tamped density of 140 g/L to 290 g/L; c) a number of silanol groups relative to BET surface area d.sub.SiOH of at least 0.5 SiOH/nm.sup.2, as determined by reaction with lithium aluminium hydride. d) a number of silicon atoms in the surface treatment agent relative to BET surface area d.sub.[Si] of at least 1.0 [Si atoms]/nm.sup.2.