There is provided a smart release potash fertilizer granule comprising a potash core; an extended release layer covering the potash core, wherein the extended release layer comprises water-swellable copolymeric nanoparticles and at least one water-soluble organic acid or water-soluble organic carboxylate salt; a controlled release layer covering the extended release layer, wherein the controlled release layer comprises water-swellable copolymeric nanoparticles; and an anticaking layer covering the controlled release layer, wherein the anticaking layer comprises water-insoluble copolymeric nanoparticles.

Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

A primer composition that resists peeling and cracking is provided that includes an acrylic copolymer having a Tg of between −15 and −35° C.

The present invention provides a curable composition having an excellent permeability to a porous substrate and a sufficient strength for use as a coating film, and also having a suitable curing time (set time), accordingly the curable composition having a pot life from the application until the completion of the permeation to pore portions. Particularly, the present invention also provides a favorable coating agent for surface reinforcement coating of a porous substrate. These objects can be achieved by using a curable composition containing the following (A) and (B): (A) a cyanoacrylate compound; and (B) a hydrofluoroether having such a structure that the number of carbon atoms substituted only with fluorine in the molecule is 1 or more to 6 or less, and the number of carbon atoms in the molecule is less than 7.

Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

A latex composition for dip molding includes a carboxylic acid-modified nitrile-based copolymer latex and a cholate-based emulsifier, wherein the cholate-based emulsifier is included in an amount of 0.02 to 3 parts by weight based on a solid content with respect to a solid content of 100 parts by weight of the carboxylic acid-modified nitrile-based copolymer latex. A method of preparing the latex composition for dip molding and a molded article produced using the same are also provided.