C09D183/02

Transparent resin substrate

A transparent resin substrate composed of a light-transmitting resin base sheet, and an underlying layer, a hard coat layer, and an antireflection coating formed sequentially on the base sheet. The antireflection coating includes a medium refractive index layer on the hard coat layer, and a low refractive index layer on the medium refractive index layer. The underlying layer is a cured product of a hexa- or higher functional urethane acrylate monomer. The hard coat layer is a cured product of a hard coat layer composition containing a polymerizable monomer containing 50% by mass or more of a tri- or lower functional urethane acrylate monomer, silica particles, a silane coupling agent, and a metal chelate compound. The medium refractive index layer is a cured product of a medium refractive index layer composition. The low refractive index layer is a particle-free cured product of a low refractive index layer composition.

Production method for silica-coated spherical silicone elastomer particles and silica-coated spherical silicone elastomer particles
11485826 · 2022-11-01 · ·

A method for producing silica-coated spherical silicone elastomer particles which includes a step in which a tetraalkoxysilane (E) is added to a liquid comprising spherical silicone elastomer particles (A), an alkaline substance (B), one or more ingredients (C) selected from among cationic surfactants and cationic water-soluble polymers, and water (D), and the tetraalkoxysilane is hydrolyzed and condensed to thereby coat the surfaces of the spherical silicone elastomer particles with silica.

COATING COMPOSITION, COATED ASSEMBLY AND METHOD OF SEALING THE SURFACE OF A FIBROUS WEB
20220340774 · 2022-10-27 ·

The present disclosure provides a high temperature, flame resistant and flexible coating composition based on alkali silicate and fluoropolymers. The coating can be used to bond a surface of a non-woven mat and seal the edges. The coating composition can be applied using a coating method on the surface and the edges of, for example, an inorganic fiber based non-woven mat.

COATING COMPOSITION, COATED ASSEMBLY AND METHOD OF SEALING THE SURFACE OF A FIBROUS WEB
20220340774 · 2022-10-27 ·

The present disclosure provides a high temperature, flame resistant and flexible coating composition based on alkali silicate and fluoropolymers. The coating can be used to bond a surface of a non-woven mat and seal the edges. The coating composition can be applied using a coating method on the surface and the edges of, for example, an inorganic fiber based non-woven mat.

COMPOSITION FOR COATING AN OVERHEAD CONDUCTOR
20230065601 · 2023-03-02 ·

A composition for coating an overhead conductor is disclosed comprising: (i) a reflective agent; (ii) a photocatalytic agent comprising ≥70 wt % anatase titanium dioxide (TiO2) having an average particle size (“aps”) ≤100 nm; (iii) a non-aqueous solvent; and (iv) one or more alkyl silicate binders.

COMPOSITION FOR COATING AN OVERHEAD CONDUCTOR
20230065601 · 2023-03-02 ·

A composition for coating an overhead conductor is disclosed comprising: (i) a reflective agent; (ii) a photocatalytic agent comprising ≥70 wt % anatase titanium dioxide (TiO2) having an average particle size (“aps”) ≤100 nm; (iii) a non-aqueous solvent; and (iv) one or more alkyl silicate binders.

MICROBIAL REDUCTION COATING COMPOSITIONS AND METHODS OF USE THEREOF

In an embodiment, the present disclosure pertains to a method of coating a substrate to impart antiviral and water resistance to the substrate. In general, the method includes obtaining a substrate and applying a coating composition to the substrate. In some embodiments, the coating composition imparts antiviral and water resistance properties to the substrate. In some embodiments, the coating composition has an antiviral method of action against a virus by causing damage to at least one of a capsid of the virus, an outer envelope of a protein layer of the virus, a spike protein of the virus, a cellular membrane of the virus, or combinations thereof.

MICROBIAL REDUCTION COATING COMPOSITIONS AND METHODS OF USE THEREOF

In an embodiment, the present disclosure pertains to a method of coating a substrate to impart antiviral and water resistance to the substrate. In general, the method includes obtaining a substrate and applying a coating composition to the substrate. In some embodiments, the coating composition imparts antiviral and water resistance properties to the substrate. In some embodiments, the coating composition has an antiviral method of action against a virus by causing damage to at least one of a capsid of the virus, an outer envelope of a protein layer of the virus, a spike protein of the virus, a cellular membrane of the virus, or combinations thereof.

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS

The object of the present invention is to provide resist underlayer film-forming composition for forming resist underlayer film usable as hard mask and removable by wet etching process using chemical solution such as sulfuric acid/hydrogen peroxide. A resist underlayer film-forming composition for lithography comprises a component (A) and component (B), the component (A) includes a hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, the hydrolyzable silane includes hydrolyzable silane of Formula (1):R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4−(a+b) (where R.sup.1 is organic group of Formula (2):

##STR00001##

and is bonded to silicon atom through a Si—C bond; R.sup.3 is an alkoxy group, acyloxy group, or halogen group; is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3), and the component (B) is cross-linkable compound having ring structure having alkoxymethyl group or hydroxymethyl group, cross-linkable compound having epoxy group or blocked isocyanate group.

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS

The object of the present invention is to provide resist underlayer film-forming composition for forming resist underlayer film usable as hard mask and removable by wet etching process using chemical solution such as sulfuric acid/hydrogen peroxide. A resist underlayer film-forming composition for lithography comprises a component (A) and component (B), the component (A) includes a hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, the hydrolyzable silane includes hydrolyzable silane of Formula (1):R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4−(a+b) (where R.sup.1 is organic group of Formula (2):

##STR00001##

and is bonded to silicon atom through a Si—C bond; R.sup.3 is an alkoxy group, acyloxy group, or halogen group; is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3), and the component (B) is cross-linkable compound having ring structure having alkoxymethyl group or hydroxymethyl group, cross-linkable compound having epoxy group or blocked isocyanate group.