C09G1/14

METHOD FOR TREATING A SURFACE OF A METALLIC PART OF A TURBOMACHINE
20230203608 · 2023-06-29 · ·

A method for treating a surface of a metallic part in particular of a turbomachine includes a step of shot-peening a surface of the metallic part using metallic beads and a step of cleaning the surface of the metallic part after the shot peening. The cleaning comprises step includes applying a magnetic cleaning paste to the surface of the metallic part in such a way as to remove any residues of metallic beads.

Polishing slurry, method for polishing glass, and method for manufacturing glass
11370939 · 2022-06-28 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

Polishing slurry, method for polishing glass, and method for manufacturing glass
11370939 · 2022-06-28 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

CMP slurry solution for hardened fluid material

A slurry solution for a Chemical Mechanical Polishing (CMP) process includes a wetting agent, a stripper additive that comprises at least one of: N-methyl-2-pyrrolidone (NMP), dimethyl sulfoxide (DMSO), sulfolane, and dimethylformamide (DMF), and an oxidizer additive comprising at least one of: hydrogen peroxide (H.sub.2O.sub.2), ammonium persulfate ((NH.sub.4).sub.2S.sub.2O.sub.8), peroxymonosulfuric acid (H.sub.2SO.sub.5), ozone (O.sub.3) in de-ionized water, and sulfuric acid (H.sub.2SO.sub.4).

CMP slurry solution for hardened fluid material

A slurry solution for a Chemical Mechanical Polishing (CMP) process includes a wetting agent, a stripper additive that comprises at least one of: N-methyl-2-pyrrolidone (NMP), dimethyl sulfoxide (DMSO), sulfolane, and dimethylformamide (DMF), and an oxidizer additive comprising at least one of: hydrogen peroxide (H.sub.2O.sub.2), ammonium persulfate ((NH.sub.4).sub.2S.sub.2O.sub.8), peroxymonosulfuric acid (H.sub.2SO.sub.5), ozone (O.sub.3) in de-ionized water, and sulfuric acid (H.sub.2SO.sub.4).

METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES
20230323157 · 2023-10-12 ·

Methods of temporarily enhancing the luster and/or brilliance of a piece of jewelry, a gem stone, or a piece of jewelry including a gem stone including applying a non-aqueous composition to the piece of jewelry, the gem stone, or the piece of jewelry including a gem stone.

METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES
20230323157 · 2023-10-12 ·

Methods of temporarily enhancing the luster and/or brilliance of a piece of jewelry, a gem stone, or a piece of jewelry including a gem stone including applying a non-aqueous composition to the piece of jewelry, the gem stone, or the piece of jewelry including a gem stone.

Polishing slurry, method for polishing glass, and method for manufacturing glass
11518912 · 2022-12-06 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

Polishing slurry, method for polishing glass, and method for manufacturing glass
11518912 · 2022-12-06 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

POLISHING SLURRY, METHOD FOR POLISHING GLASS, AND METHOD FOR MANUFACTURING GLASS
20210269676 · 2021-09-02 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.