The present invention relates to a polyisocyanate composition comprising, on the basis of the total mass of the polyisocyanate composition, 97 weight % or more of a polyisocyanate, and 2.0 mass ppm or more and 1.0×10.sup.4 mass ppm or less of a compound having at least one unsaturated bond in which the compound is a different compound from the polyisocyanate, or 5.0 mass ppm or more and 2.0×10.sup.4 mass ppm or less of at least one inactive compound selected from the group consisting of a hydrocarbon compound, an ether compound, a sulfide compound, a halogenated hydrocarbon compound, a Si-containing hydrocarbon compound, a Si-containing ether compound, and a Si-containing sulfide compound.

The present invention relates to an additive composition for controlling and inhibiting polymerization of monomers, wherein the composition comprises a combination of (a) a phenol compound comprising catechol compound with (b1) an aliphatic tertiary amine, (b2) oxide treated derivative of the aliphatic tertiary amine, or (b2) a mixture thereof, wherein the aliphatic tertiary amine contains one or more hydroxyl groups in the alkyl chain of the aliphatic tertiary amine. In one embodiment, the present invention also relates to a method for controlling and inhibiting polymerization of monomers by employing the additive composition of the present invention. In another embodiment, the present invention also relates to a method of using the additive composition of the present invention for controlling and inhibiting polymerization of monomers. In another embodiment, the present invention also relates to methods for controlling and inhibiting polymerization of monomers in a primary fractionator (or an ethylene plant), and for operating a primary fractionator, and for reducing fouling and polymer deposits in a primary fractionator, and to extend a run-length of a primary fractionator or of an ethylene plant.

The present invention relates to an additive composition for controlling and inhibiting polymerization of monomers, wherein the composition comprises a combination of (a) a phenol compound comprising catechol compound with (b1) an aliphatic tertiary amine, (b2) oxide treated derivative of the aliphatic tertiary amine, or (b2) a mixture thereof, wherein the aliphatic tertiary amine contains one or more hydroxyl groups in the alkyl chain of the aliphatic tertiary amine. In one embodiment, the present invention also relates to a method for controlling and inhibiting polymerization of monomers by employing the additive composition of the present invention. In another embodiment, the present invention also relates to a method of using the additive composition of the present invention for controlling and inhibiting polymerization of monomers. In another embodiment, the present invention also relates to methods for controlling and inhibiting polymerization of monomers in a primary fractionator (or an ethylene plant), and for operating a primary fractionator, and for reducing fouling and polymer deposits in a primary fractionator, and to extend a run-length of a primary fractionator or of an ethylene plant.

Compositions and methods are provided for reducing, inhibiting, or preventing corrosion of a surface, the method comprising contacting an anticorrosion compound of Formula 1 with the surface, the anticorrosion compound of Formula 1 having a structure corresponding to:

##STR00001##

wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are independently selected from hydrogen, hydroxyl, alkyl, alkoxyl, aryl, alkaryl, aralkyl, and —NR.sup.8R.sup.9; R.sup.6 and R.sup.7 are independently hydrogen, a substituted alkyl, substituted alkenyl, substituted aryl, substituted alkaryl, or substituted aralkyl, wherein at least one substituent is a hydroxyl or an ether; provided that at least one of R.sup.6 and R.sup.7 is other than hydrogen; Fe and R.sup.9 are independently hydrogen, unsubstituted alkyl, unsubstituted alkenyl, unsubstituted aryl, unsubstituted alkaryl, unsubstituted aralkyl, substituted alkyl, substituted alkenyl, or substituted alkaryl, wherein at least one substituent is a hydroxyl or an ether; or any two adjacent groups of R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 form one or more ring structures.

Compositions and methods are provided for reducing, inhibiting, or preventing corrosion of a surface, the method comprising contacting an anticorrosion compound of Formula 1 with the surface, the anticorrosion compound of Formula 1 having a structure corresponding to:

##STR00001##

wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are independently selected from hydrogen, hydroxyl, alkyl, alkoxyl, aryl, alkaryl, aralkyl, and —NR.sup.8R.sup.9; R.sup.6 and R.sup.7 are independently hydrogen, a substituted alkyl, substituted alkenyl, substituted aryl, substituted alkaryl, or substituted aralkyl, wherein at least one substituent is a hydroxyl or an ether; provided that at least one of R.sup.6 and R.sup.7 is other than hydrogen; Fe and R.sup.9 are independently hydrogen, unsubstituted alkyl, unsubstituted alkenyl, unsubstituted aryl, unsubstituted alkaryl, unsubstituted aralkyl, substituted alkyl, substituted alkenyl, or substituted alkaryl, wherein at least one substituent is a hydroxyl or an ether; or any two adjacent groups of R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 form one or more ring structures.

A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.

A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.

Disclosed are compounds represented by structural formula

##STR00001## methods of producing compounds represented by structural formula, and their use in inhibiting oxidation in an oxidizable material.

Disclosed are compounds represented by structural formula

##STR00001## methods of producing compounds represented by structural formula, and their use in inhibiting oxidation in an oxidizable material.

Described are compounds, compositions, and methods that include a nitrogen- and oxygen-containing aromatic compound, such as an aminophenol-based compound, which can be used for inhibiting polymerization of a monomer (e.g., styrene) composition. The compound includes a tertiary amine group wherein the nitrogen is attached to carbon-containing groups, and at least one of oxygen atom separated from the nitrogen by one or more carbon atoms. The antipolymerant can provide excellent antipolymerant activity in a monomer-containing composition.