A polyurethane-based UV absorber, obtained by reacting a UV absorber having a reactive hydrogen with a polyisocyanate and a diol or polyol; wherein the weight average molecular weight of the polyurethane-based UV absorber is in a range of 10,000 to 200,000.

A polyurethane-based UV absorber, obtained by reacting a UV absorber having a reactive hydrogen with a polyisocyanate and a diol or polyol; wherein the weight average molecular weight of the polyurethane-based UV absorber is in a range of 10,000 to 200,000.

A compound or a salt thereof, a CMP slurry composition including the same, and a polishing method using the same, the compound being represented by Formula 1,

##STR00001##

A compound or a salt thereof, a CMP slurry composition including the same, and a polishing method using the same, the compound being represented by Formula 1,

##STR00001##

The present invention relates to a stripper composition for removing a photoresist in a process of manufacturing a semiconductor device.

According to the present invention, it is possible to prevent corrosion of the underlying film while improving the peeling force for the photoresist, and to improve the stability of the composition over time.

The present invention relates to a stripper composition for removing a photoresist in a process of manufacturing a semiconductor device.

According to the present invention, it is possible to prevent corrosion of the underlying film while improving the peeling force for the photoresist, and to improve the stability of the composition over time.

This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one organic solvent; 4) at least one amine compound; and 5) water.

This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one organic solvent; 4) at least one amine compound; and 5) water.

A cerium oxide nanoparticle is produced by mixing a solution of an aromatic heterocyclic compound having no substituent or at least one substituent selected from the group consisting of a methyl group, an ethyl group, an amino group, an aminomethyl group, a monomethylamino group, a dimethylamino group, and a cyano group and containing 2 to 8 carbon atoms and 1 to 4 nitrogen atoms in a ring structure of the aromatic heterocyclic compound, with a solution containing a cerium (III) ion or with a cerium (III) salt, followed by addition of an oxidant.

A cerium oxide nanoparticle is produced by mixing a solution of an aromatic heterocyclic compound having no substituent or at least one substituent selected from the group consisting of a methyl group, an ethyl group, an amino group, an aminomethyl group, a monomethylamino group, a dimethylamino group, and a cyano group and containing 2 to 8 carbon atoms and 1 to 4 nitrogen atoms in a ring structure of the aromatic heterocyclic compound, with a solution containing a cerium (III) ion or with a cerium (III) salt, followed by addition of an oxidant.