The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to compositions comprising these compounds.

This invention provides a liquid composition that removes titanium nitride from a substrate without corroding tungsten or a low-k interlayer dielectric also present on said substrate. Said liquid composition has a pH between 0 and 4, inclusive, and contains the following: at least one oxidizing agent (A) selected from the group consisting of potassium permanganate, ammonium peroxodisulfate, potassium peroxodisulfate, and sodium peroxodisulfate; a fluorine compound (B); and a tungsten-corrosion preventer (C). The tungsten-corrosion preventer (C) either contains at least two different compounds selected from a group of compounds (C1) consisting of alkylamines, salts thereof, fluoroalkylamines, salts thereof, and the like or contains at least one compound selected from said group of compounds (C1) and at least one compound selected from a group of compounds (C2) consisting of polyoxyalkylene alkylamines, polyoxyalkylene fluoroalkylamines, and the like. The mass concentration of potassium permanganate in the abovementioned oxidizing agent (A) is between 0.001% and 0.1%, inclusive, and the mass concentration of the abovementioned fluorine compound (B) is between 0.01% and 1%, inclusive.

Cleaning compositions including one or more non-ionic surfactants; one or more quaternary ammonium compounds; at least one citrus terpene; one or more chelating agent and water, the cleaning compositions useful for cleaning alkaline surfaces such as building gutters.

A cleaning solvent composition comprises from about 0.2 to 15 weight percent of mono- or di-phosphate ester in free acid form, and from about 85 to 99.8 weight percent of one or more halogenated hydrocarbon solvents. Other cleaning solvent compositions further comprise one or more alcohols. For example, such alcohol-containing compositions may comprise from about 0.2 to 15 weight percent of mono- or di-phosphate ester in free acid form, from about 2 to about 25 weight percent of one or more alcohols, and from about 25 to about 97.8 weight percent of one or more halogenated hydrocarbon solvents.

Several of the films that comprise various energy producing or control devices, for example, electrochromic devices, lithium batteries, and photovoltaic cells, are sensitive to moisture in some way. They may be especially vulnerable to moisture at particular stages during their fabrication. It may also be highly desirable during fabrication to be able to wash particulates from the surface. The particulates may be generated some aspect of the fabrication process, or they may arise from the environment in which the fabrication takes place. This invention shows ways to remove said particles from the surface without incurring the damage associated with typical washing processes, resulting in higher manufacturing yields and better device performance.

Several of the films that comprise various energy producing or control devices, for example, electrochromic devices, lithium batteries, and photovoltaic cells, are sensitive to moisture in some way. They may be especially vulnerable to moisture at particular stages during their fabrication. It may also be highly desirable during fabrication to be able to wash particulates from the surface. The particulates may be generated some aspect of the fabrication process, or they may arise from the environment in which the fabrication takes place. This invention shows ways to remove said particles from the surface without incurring the damage associated with typical washing processes, resulting in higher manufacturing yields and better device performance.

Hard surface, in particular glass, cleaners having an ease in wipe-out while providing good cleaning with a streak-free, glossy shine are described. The cleaner includes at least one fluorosurfactant including a fluorinated functional group with 2 to 6 carbon atoms, and a hydrophilic moiety; at least one non-fluorinated surfactant; a combination of solvents; a combination of cleaning agents; and water.

An improved composition and method of use is provided which is suitable for treating live animal growth facility, meat processing facilities and food processing facilities. The composition comprises 34-99.35 wt % water; 0.1 to 3 wt % hydrophobizing agents; up to 5 wt % antistatic agents; 0.05 to 3 wt % wetting agents; and 0.5 to 55 wt % film forming agent. The composition is applied to surfaces and allowed to dry.

The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to compositions comprising these compounds.

A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. ##STR00001## (R.sup.1 represents a C.sub.1-C.sub.18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R.sup.2 mutually independently represents a monovalent organic group having a C.sub.1-C.sub.18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). a is an integer of from 0 to 2.)