Fabric care compositions, and more specifically, fabric care compositions that include a surfactant system, silicone, and a polyetheramine. Methods of making and using such compositions.

Fabric care compositions, and more specifically, fabric care compositions that include a surfactant system, silicone, and a polyetheramine. Methods of making and using such compositions.

Sulfated oligohydroxycarboxylic acid esters have the general formula (I): ##STR00001##
wherein at least one of the radicals A is —SO.sub.3B. Cosmetic and pharmaceutical agents contain said esters. These esters are effective as anionic surfactants.

Sulfated oligohydroxycarboxylic acid esters have the general formula (I): ##STR00001##
wherein at least one of the radicals A is —SO.sub.3B. Cosmetic and pharmaceutical agents contain said esters. These esters are effective as anionic surfactants.

An object of the present invention is to provide a cleaning liquid that effectively removes in a short time organic residues and abrasive grains derived from a slurry in a semiconductor substrate in which a Co contact plug and/or Co wiring are present.

The present invention relates to a cleaning liquid composition for cleaning a substrate having a Co contact plug and/or Co wiring, which contains one or more reducing agents and water. Furthermore, the present invention relates to a cleaning liquid composition for cleaning a substrate having Co and not having Cu, which contains one or more reducing agents and water and has a pH of 3 or more and less than 12.

An object of the present invention is to provide a cleaning liquid that effectively removes in a short time organic residues and abrasive grains derived from a slurry in a semiconductor substrate in which a Co contact plug and/or Co wiring are present.

The present invention relates to a cleaning liquid composition for cleaning a substrate having a Co contact plug and/or Co wiring, which contains one or more reducing agents and water. Furthermore, the present invention relates to a cleaning liquid composition for cleaning a substrate having Co and not having Cu, which contains one or more reducing agents and water and has a pH of 3 or more and less than 12.

A process for producing a bio-based surfactant comprising an alkyl disulphate salt comprises the steps of methanolysis of medium chain length polyhydroxyalkanoic acid (mcl-PHA) to provide hydroxy fatty acid methyl ester monomers (HFAME's), reduction of the HFAME's to provide 1,3 alkyl diols, sulphation of the 1,3 alkyl diols to provide 1,3 alkyl disulphates, and neutralisation of the alkyl disulphates to provide a bio-based surfactant comprising 1,3 alkyl disulphate salt. A bio-based surfactant comprising a mixture of medium chain length 1,3 alkyl disulphate salts is also described.

A process for producing a bio-based surfactant comprising an alkyl disulphate salt comprises the steps of methanolysis of medium chain length polyhydroxyalkanoic acid (mcl-PHA) to provide hydroxy fatty acid methyl ester monomers (HFAME's), reduction of the HFAME's to provide 1,3 alkyl diols, sulphation of the 1,3 alkyl diols to provide 1,3 alkyl disulphates, and neutralisation of the alkyl disulphates to provide a bio-based surfactant comprising 1,3 alkyl disulphate salt. A bio-based surfactant comprising a mixture of medium chain length 1,3 alkyl disulphate salts is also described.

The surfactants of the general formula (I), in which R represents hydrogen or a linear or branched alkyl, alkenyl, alkylaryl or alkenylaryl group having 5 to 25 C atoms, n represents a number from 1 to 21 and m represents a number from 0 to 20, the sum of n and m being less than 22, and X+ represents a charge-balancing cation. The surfactants can be easily incorporated into washing or cleaning agents, have outstanding practical properties and can be produced on the basis of renewable raw materials.

The surfactants of the general formula (I), in which R represents hydrogen or a linear or branched alkyl, alkenyl, alkylaryl or alkenylaryl group having 5 to 25 C atoms, n represents a number from 1 to 21 and m represents a number from 0 to 20, the sum of n and m being less than 22, and X+ represents a charge-balancing cation. The surfactants can be easily incorporated into washing or cleaning agents, have outstanding practical properties and can be produced on the basis of renewable raw materials.