The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon. Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.

The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon. Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Disclosed are latexes, suspensions, and colloids having a cationic antimicrobial compound complexed with an anionic surfactant. The surfactant may have greater affinity for the antimicrobial compound than other anionic surfactants and other anions in the latex, suspension, or colloid that contribute to disperse phase stability to prevent disrupting the dispersions. Dispersions containing the antimicrobial compound may therefore have a shelf life comparable to dispersions that are otherwise identical but lack the cationic antimicrobial compound and its complexed anionic surfactant. Coatings made with the complexes can exhibit essentially undiminished antimicrobial activity.

An object of the present invention to provide a treatment liquid for a semiconductor device, where the treatment liquid has an excellent corrosion prevention property with respect to a metal-containing layer and excellent removability of an object to be removed, and also has excellent solubility in a post-treatment liquid. In addition, an object of the present invention is to provide a substrate treatment method using the treatment liquid.

The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which contains water, a removing agent, and a copolymer, and the copolymer has a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.

An object of the present invention to provide a treatment liquid for a semiconductor device, where the treatment liquid has an excellent corrosion prevention property with respect to a metal-containing layer and excellent removability of an object to be removed, and also has excellent solubility in a post-treatment liquid. In addition, an object of the present invention is to provide a substrate treatment method using the treatment liquid.

The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which contains water, a removing agent, and a copolymer, and the copolymer has a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.

Disclosed are latexes, suspensions, and colloids having a cationic antimicrobial compound complexed with an anionic surfactant. The surfactant may have greater affinity for the antimicrobial compound than other anionic surfactants and other anions in the latex, suspension, or colloid that contribute to disperse phase stability to prevent disrupting the dispersions. Dispersions containing the antimicrobial compound may therefore have a shelf life comparable to dispersions that are otherwise identical but lack the cationic antimicrobial compound and its complexed anionic surfactant. Coatings made with the complexes can exhibit essentially undiminished antimicrobial activity.

Disclosed are latexes, suspensions, and colloids having a cationic antimicrobial compound complexed with an anionic surfactant. The surfactant may have greater affinity for the antimicrobial compound than other anionic surfactants and other anions in the latex, suspension, or colloid that contribute to disperse phase stability to prevent disrupting the dispersions. Dispersions containing the antimicrobial compound may therefore have a shelf life comparable to dispersions that are otherwise identical but lack the cationic antimicrobial compound and its complexed anionic surfactant. Coatings made with the complexes can exhibit essentially undiminished antimicrobial activity.

The invention relates to a method of making solid cleansing compositions which comprise a non-soap anionic surfactant, a carrier, an emulsifier and water. The method entails preparing an emulsion of the components at an elevated temperature using excess water and subjecting the emulsion to cooling and solidification, wherein the water content is reduced. The invention further relates to the emulsions and to the novel solid cleansing compositions formed therefrom.