The invention relates to a cleaning product comprising: an inverted container assembly (10) comprising an inverted container (11) and a liquid dispenser (15) attached to a bottom surface (12) of the inverted container (11), and a viscous cleaning composition contained in the inverted container assembly (10).

The invention relates to a cleaning product comprising: an inverted container assembly (10) comprising an inverted container (11) and a liquid dispenser (15) attached to a bottom surface (12) of the inverted container (11), and a viscous cleaning composition contained in the inverted container assembly (10).

A method of forming a gel or gel-like detergent composition comprising: dosing a solid composition, and dosing a liquid composition; into a water-soluble container.

A method of forming a gel or gel-like detergent composition comprising: dosing a solid composition, and dosing a liquid composition; into a water-soluble container.

An object of the present invention is to provide an inkjet aqueous composition that can sufficiently and easily prevent deterioration or corrosion of a silicon member that forms an ink channel. The present invention relates to an inkjet aqueous composition containing an aqueous medium and a surfactant, in which the surfactant includes a polysiloxane compound having a siloxane structure (—Si—O—) with a repetition number of 5 or more and 1000 or less, and to an inkjet aqueous ink, an inkjet aqueous primer, an inkjet aqueous cleaning liquid, an inkjet aqueous preservation liquid, and an inkjet recording device.

An object of the present invention is to provide a treatment liquid for a semiconductor device, which is excellent in removal performance for residues present on a substrate, and to provide a substrate washing method using the treatment liquid.

The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which includes water, a basic compound, hexylene glycol, and a compound A that is at least one kind selected from the group consisting of isobutene, (E)-2-methyl-1,3-pentadiene, 4-methyl-1,3-pentadiene, 2,2,4-trimethyloxetane, 4-methyl-3-penten-2-ol, and 2,4,4,6-tetramethyl-1,3-dioxane.

Disclosed herein are personal care compositions comprising Zn:usnate complexes having a 1:2 zinc to usnate molar ratio. Methods of making and using the compositions are also provided. The personal care compositions may include a cleansing component and an antibacterial component, wherein the antibacterial component comprises Zn:usnate complexes having a 1:2 zinc to usnate molar ratio.

An object of the present invention is to provide a treatment liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a chemical mechanical polishing method and a method for treating a semiconductor substrate.

The treatment liquid of an embodiment of the present invention is a treatment liquid for a semiconductor substrate, which includes a component A having two or more onium structures in the molecule and water, and has a pH of 6.0 to 13.5 at 25° C.

A method of making a translucent cleaning composition is disclosed. The method includes providing a perfume; providing a hydrogen bond receiving compound; providing a hydrogen bond providing compound; combining the hydrogen bond receiving compound with the hydrogen bond providing compound to create a eutectic liquid; adding the perfume to the eutectic liquid to create a perfumed eutectic liquid; and adjusting the pH of the perfumed eutectic liquid to above 6.0.

A method of making a translucent cleaning composition is disclosed. The method includes providing a perfume; providing a hydrogen bond receiving compound; providing a hydrogen bond providing compound; combining the hydrogen bond receiving compound with the hydrogen bond providing compound to create a eutectic liquid; adding the perfume to the eutectic liquid to create a perfumed eutectic liquid; and adjusting the pH of the perfumed eutectic liquid to above 6.0.