C11D2111/40

STAIN REMOVAL SYSTEMS AND METHODS
20200385654 · 2020-12-10 · ·

Systems and methods are provided for removing a stain from a surface. A first solution is applied to the stain, wherein the first solution comprises a combination of an ammoniated substance such as ammonium hydroxide and an alcohol such as isopropanol. A second solution is then applied to the stain treated with the first solution, wherein the second solution comprises between approximately 6% and approximately 15% hydrogen peroxide.

METHOD OF FORMING PROCESS FILM

A method of forming a process film includes the following operations. A substrate is transferred into a process chamber having an interior surface. A process film is formed over the substrate, and the process film is also formed on the interior surface of the process chamber. The substrate is transferred out of the process chamber. A non-process film is formed on the interior surface of the process chamber. In some embodiments, porosity of the process film is greater than a porosity of the non-process film.

Two solution stain removal systems and methods comprising an alcohol-based solution and a peroxide-based solution

Systems and methods are provided for removing a stain from a surface. A first solution is applied to the stain, wherein the first solution comprises a combination of an ammoniated substance such as ammonium hydroxide and an alcohol such as isopropanol. A second solution is then applied to the stain treated with the first solution, wherein the second solution comprises between approximately 6% and approximately 15% hydrogen peroxide.

Method of cleaning process chamber

A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.

Nail gel removal method
10617191 · 2020-04-14 ·

A nail gel removal method includes the steps of (a) absorbing warm water, which is water having a temperature higher than the room temperature, with the nail gel coated on the nail a user by soaking one or more nails in the warm water for three minutes or more; (b) softening the nail gel on the nail of the user until it is removable from the nail of the user; and (c) removing the softened nail gel from the nail of the user.

LIQUID DETERGENT COMPOSITION
20240141260 · 2024-05-02 ·

A liquid detergent composition comprising manganese 1,4,7-triazacyclononane (MnTACN) and derivatives thereof, a hydrotrope and a non-ionic surfactant, wherein the composition is contained in a water-soluble film; and wherein the hydrotope is selected from the group comprising salts of cumenesulphonate, xylenesulphonate and/or toluenesulphonate. Use of the composition in an automatic dishwashing process.

METHOD OF CLEANING PROCESS CHAMBER

A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.

STAIN REMOVAL SYSTEMS AND METHODS
20190264144 · 2019-08-29 · ·

Systems and methods are provided for removing a stain from a surface. A first solution is applied to the stain, wherein the first solution comprises a combination of an ammoniated substance such as ammonium hydroxide and an alcohol such as isopropanol. A second solution is then applied to the stain treated with the first solution, wherein the second solution comprises between approximately 6% and approximately 15% hydrogen peroxide.

DETERGENT COMPOSITION FOR USE IN AUTOMATIC DISHWASHER
20240174946 · 2024-05-30 · ·

A detergent composition, containing the following component (a), the following component (c1), and water: component (a): a reducing agent with an oxidation-reduction potential of +71 mV or less, and component (c1): a low-foaming anionic surfactant. The composition has a content of the component (a) of 3 mass % or more, a content of water of 20 mass % or more, and a pH of 6 or more and 11 or less at 25? C.