C11D3/3749

SOLIDIFYING LIQUID AMINE OXIDE, BETAINE, AND/OR SULTAINE SURFACTANTS WITH A BINDER AND OPTIONAL CARRIER

The invention relates to solidification of liquid amine oxide, betaine, and/or sultaine surfactants with a binder to form a solidified surfactant composition. In particular, the invention relates to solidification of liquid surfactants utilizing drying device(s), wherein the feed composition contains at least one liquid surfactant and a binder and optional carrier to form a solidified surfactant composition. The solidified surfactant compositions can be useful in various cleaning compositions.

Cleaning agent comprising a polyacrylate terpolymer for removal of fouling deposits from metal surfaces

A cleaning agent comprising a polyacrylate terpolymer and a maleic olefin compound may be added to an aqueous system having a metal surface, such as a metal surface of a heat exchanger, in a concentration sufficient to remove fouling deposits from the metal surface in neutral or alkaline conditions. The removal of fouling deposits with the application of the cleaning agent may occur while the system is shut down or in service.

CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN
20220411727 · 2022-12-29 ·

A cleaning composition which is used for cleaning a coating film forming device, the composition including an acid component having a pKa of 12 or less.

COMPOSITIONS AND METHOD FOR FLOOR CLEANING OR RESTORATION

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

SUBSTRATE CLEANING COMPOSITION, METHOD FOR CLEANING SUBSTRATE USING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

A substrate cleaning composition, a method of cleaning a substrate using the same, and a method of fabricating a semiconductor device using the same, the substrate cleaning composition including a styrene copolymer including a first repeating unit represented by Formula 1-la and a second repeating unit represented by Formula 1-1b; an additive represented by Formula 2-1; and an alcoholic solvent having a solubility of 500 g/L or less in deionized water,

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Cleaning method

The invention provides a method for the cleaning of a soiled substrate, the method comprising treating the substrate with a solid particulate cleaning material and wash water, the treatment being carried out in an apparatus comprising a drum comprising perforated side walls and having a capacity of between 5 and 50 liters for each kg of fabric in the washload, wherein said solid particulate cleaning material comprises a multiplicity of polymeric particles at a particle to fabric addition level of 0.1:1-10:1 by mass, each particle being substantially cylindrical or spherical in shape and having an average density in the range of 0.5-2.5 g/cm.sup.3 and an average volume in the range of 5-275 mm.sup.3, and wherein said drum comprising perforated side walls is rotated at a speed which generates G forces in the range of from 0.05 to 900 G. The polymeric particles may comprise foamed or unfoamed polymeric materials which may comprise either linear or crosslinked polymers. Preferably, at least one detergent is employed in the cleaning process. The invention provides optimum cleaning performance as a result of improved mechanical interaction between substrate and cleaning media and is preferably used for the cleaning of textile fabrics. The method allows for significant reductions in the consumption of detergents, water and energy when compared with the conventional wet cleaning of textile fabrics, and also facilitates reduced washing-related textile fabric damage. The invention also envisages a cleaning composition comprising a solid particulate cleaning composition and at least one additional cleaning agent. In particular embodiments of the invention, the solid particulate cleaning material is separated and recovered and then re-used in subsequent cleaning processes. Typically, the solid particulate cleaning material is itself cleaned intermittently in order to maintain its efficacy.

MODIFIED POLYSACCHARIDES FOR USE AS ANTI-MICROBIAL AGENTS
20170360040 · 2017-12-21 ·

The use of at least one modified polysaccharide selected from starch, amylose, amylopectin and dextrin or a mixture thereof substituted with one or more amine and/or ammonium groups, as an antimicrobial agent, is provided by the present invention, as well as compositions comprising a polymer material blended with the modified polysaccharide. Also provided by the present invention are antimicrobial articles produced from the compositions of the invention and antimicrobial surface, fabric, foam or sponge produced by coating, soaking or dipping in a solution comprising modified polysaccharides. The present invention further provides non-therapeutic methods for killing microorganisms, inhibiting their growth, and/or preventing formation of a biofilm, and for producing an antimicrobial surface, article, fabric, foam or sponge from modified polysaccharides.

Unit Dose Fabric Softener

A unit dose fabric conditioner that contains a combination of a polyol, alkoxylated alcohol, and dispersing polymer to allow for incorporation of encapsulated fragrance slurries into unit dose fabric conditioners to disperse the encapsulated fragrance and fabric conditioner active during laundering.

Cleaning method

The invention provides a method for the cleaning of a soiled substrate, the method comprising treating the substrate with a non-polymeric solid particulate cleaning material and wash water, the treatment being carried out in an apparatus comprising a drum comprising perforated side walls and having a capacity of between 5 and 50 liters for each kg of fabric in the washload, wherein the solid particulate cleaning material comprises a multiplicity of non-polymeric particles at a particle to fabric addition level of 0.1:1-10:1 by mass, each of the particles being substantially cylindrical or spherical in shape, and wherein the drum comprising perforated side walls is rotated at a speed which generates G forces in the range of from 0.05 to 900 G. The non-polymeric particles may comprise particles of glass, silica, stone, wood, or any of a variety of metals or ceramic materials. Preferably the solid particulate cleaning material additionally comprises a multiplicity of polymeric particles each of which is substantially cylindrical or spherical in shape. Preferably, at least one detergent is employed in the cleaning process. The invention provides optimum cleaning performance as a result of improved mechanical interaction between substrate and cleaning media and is preferably used for the cleaning of textile fabrics. The method allows for significant reductions in the consumption of detergents, water and energy when compared with the conventional wet cleaning of textile fabrics, and also facilitates reduced washing-related textile fabric damage. The invention also envisages a cleaning composition comprising a solid particulate cleaning composition and at least one additional cleaning agent.

SUBSTRATE CLEANING SOLUTION AND METHOD FOR MANUFACTURING DEVICE
20220056383 · 2022-02-24 ·

To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. The present invention is a substrate cleaning solution comprising a polymer (A), an alkaline component (B), and a solvent (C), provided that the alkaline component (B) does not comprise ammonia.