Detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a) a crosslinked anionic polyelectrolyte (P) consisting of: at least one monomer unit derived from 2-methyl-2-[(1 -oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one monomer unit derived from at least one monomer chosen from the elements of the group consisting of acrylamide, N,N-dimethylacrylamide, ethacrylamide, N-isopropylacrylamide, N-tert-butylacrylamide; and at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b) ethylenediaminedisuccinic acid in trisodium salt form.

Provided are compositions useful for cleaning, such as warewashing. The compositions comprise (a) a polymer comprising polymerized units of (i) an ethylenically unsaturated carboxylic acid monomer or salt thereof, (ii) an ethylenically unsaturated sulfonic acid monomer or salt thereof, and optionally (iii) one or more further monomers or salt thereof, the polymer having a Mw from 2000 to 100,000; (b) a water soluble silicate; (c) an alkaline source; and (d) optionally a surfactant.

A process for making a particle, the particle includes: a) a nitrogen-containing cleaning-active in the form of a salt wherein the salt has a pH in 1% weight aqueous solution measured at 25° C. greater than 9; and b) a malodour-reducing agent including an acid group wherein the process includes the step of adding the malodour-reducing agent to the nitrogen-containing cleaning-active wherein the malodour-reducing agent is added in the absence of water.

Process for making a granule containing (A) at least one chelating agent selected from alkali metal salts of methyl glycine diacetic acid (MGDA) and of iminodisuccinic acid (IDS), and, optionally, (B) at least one homo- or copolymer of (meth)acrylic acid, partially or fully neutralized with alkali,
said process comprising the steps of (a) providing an aqueous solution or slurry containing chelating agent (A) and, if applicable, (co)polymer (B), (b) removing most of said water by spray granulation in a fluidized bed, (c) treating the resultant granule in a vessel of which at least one part rotates around a horizontal axis and wherein said vessel is selected from paddle mixers, free-fall mixers and plough share mixers.

Provided are formulations that offer a high cleaning effect on inorganic particles, organic residues, chemical residues, reaction products on the surface due to interaction of the wafer surface with the Chemical Mechanical Planarization (CMP) slurry and elevated levels of undesirable metals on the surface left on the semiconductor devices after the CMP. The post-CMP cleaning formulations comprise one or more organic acid, one or more polymer and a fluoride compound with pH<7 and optionally a surfactant with two sulfonic acid groups.

The invention relates to compositions and methods of treatment employing compositions comprising polyelectrolyte complexes. The compositions include a water-soluble first polyelectrolyte bearing a net cationic charge or capable of developing a net cationic charge and a water-soluble second polyelectrolyte bearing a net anionic charge or capable of developing a net anionic charge. The total polyelectrolyte concentration of the first solution is at least 110 millimolar. The composition is free of coacervates, precipitates, latex particles, synthetic block copolymers, silicone copolymers, cross-linked poly(acrylic) and cross-linked water-soluble polyelectrolyte. The composition may be a concentrate, to be diluted prior to use to treat a surface.

The application relates to a shaped detergent product comprising 10-100 wt. % of a solid amorphous phase and 0-90 wt. % of one or more other solid phases, wherein the solid amorphous phase comprises 25-88 wt. % free acid equivalent of aminopolycarboxylate, 10-60 wt. % free acid equivalent of an acid, wherein the acid is not an aminopolycarboxylate, 2-30 wt. % water, and wherein the shaped detergent product contains at least 0.5 wt. % surfactant.

A cleaning agent comprising a polyacrylate terpolymer and a maleic olefin compound may be added to an aqueous system having a metal surface, such as a metal surface of a heat exchanger, in a concentration sufficient to remove fouling deposits from the metal surface in neutral or alkaline conditions. The removal of fouling deposits with the application of the cleaning agent may occur while the system is shut down or in service.

This invention concerns a transparent composition comprising at least a first amphoteric water-soluble polymer, which comprises: A units of a cationic monomer selected from: acidified or quaternised dimethylaminoethyl acrylate salts, acidified or quaternised dimethylaminoethyl methacrylate salts, acidified or quaternised dimethylaminopropyl acrylamide salts, and acidified or quaternised dimethylaminopropyl methacrylamide salts, and mixtures thereof; B units of 2-acrylamido-2-methylpropanesulphonic acid and/or salts thereof; and optionally C units of acrylamide,

characterised in that the molar ratio between the A units of cationic monomer and the B units of 2-acrylamido-2-methylpropanesulphonic acid and/or salts thereof is between 0.4 and 1.4.

A disinfectant cleaning composition, the composition comprising: a nitrogen containing biocidal compound; a polymer comprising monomers of the following formulae: a) H2C═CR1-CO—NH—R2-N+R3R4R5X— wherein R1 represents hydrogen or C1-C4 alkyl; R2 represents linear or branched C1-C12 alkylene; R3, R4 and R5, independently of one another, each represent hydrogen, C1-C18 alkyl or phenyl; and X— represents an anion selected from the group consisting of halide, sulfate, alkylsulfate, hydroxide, phosphate, acetate and formate; b) 40-75% by weight of N-isopropylacrylamide, based on the water-soluble polymer; c) acrylic and/or methacrylic acid and/or salts thereof; and d) H2C═CR—CO—NH—CR′R″R′″—SO3H, and salts thereof; wherein R, R′ and R″ independently represent hydrogen, C1-C4 alkyl or C1-C4 alkylene, and R′″ independently represents C1-C4 alkyl or C1-C4 alkylene.