An article is provided including an aqueous liquid detergent, and a package for the aqueous liquid detergent which is in direct contact with the aqueous liquid detergent, wherein the package is formed from a water-soluble, film-forming material. The aqueous liquid detergent includes at least about 40% by weight of water based on the total weight of the aqueous liquid detergent, a builder comprising potassium carbonate, wherein the potassium carbonate is present in an amount of at least about 25 weight percent, based on the total weight of the aqueous liquid detergent, a first surfactant, wherein the first surfactant is an anionic surfactant, and a second surfactant, wherein the second surfactant is a nonionic or an amphoteric surfactant. The first surfactant and the second surfactant are present in a combined total amount of about 0.1% to about 25% percent by weight based on the total weight of the aqueous liquid detergent.

Disclosed herein are carboxymethylated polylysines as dispersing agents and/or chelating agents. Additionally disclosed are detergent compositions and peroxy bleaching compositions including carboxymethylated polylysines. Further disclosed is a method for formulating a detergent composition or a peroxy bleaching composition with the carboxymethylated polylysines.

Stabilized compositions employing a binding system for improving shelf stability of an activated bleach composition containing a peroxygen source and a catalyst activator are disclosed. Stabilized compositions employ a binding system comprising an anionic surfactant for a solid formulation of a catalyst activator and peroxygen source to provide shelf stability for an activated bleach composition. Methods of formulating and use are further disclosed.

Stabilized hydrogen peroxide-containing compositions and methods of making same are disclosed. The compositions contain a stabilizer system made up of a disulfonate surfactant, a diester solvent, and a sulfonic acid or a salt thereof in a sufficient quantity to provide the stabilized hydrogen peroxide with an acidic pH value. The compositions are suitable for use as disinfectants, as cleaning agents, and in various personal care applications such as hair care and tooth whitening.

The present invention relates generally to stable percarboxylic acid compositions comprising, inter alia, at least two stabilizing agents, and various uses for water treatments, including water treatments in connection with oil- and gas-field operations. The present invention also relates to slick water compositions and gel based compositions that comprise stable percarboxylic acid compositions and the use thereof in oil- and gas-field operations.

The present invention relates generally to stable percarboxylic acid compositions comprising, inter alia, at least two stabilizing agents, and various uses for water treatments, including water treatments in connection with oil- and gas-field operations. The present invention also relates to slick water compositions and gel based compositions that comprise stable percarboxylic acid compositions and the use thereof in oil- and gas-field operations.

A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.

A composition for use as a hard surface cleaner, sanitizer and/or disinfectant is disclosed. The composition according to one embodiment comprises an arylsulfonic acid, a source of peroxide, an effective amount of a stabilizer and water. A method is provided of cleaning, disinfecting and/or sanitizing a hard surface, the method comprising providing the composition, providing a surface which requires cleaning and applying the composition onto the surface for a duration of time sufficiently long enough to destroy micro-organisms present on the surface.

Stabilized peroxide-containing compositions stabilized with urea and urea/chelator stabilizer blends are provided. The compositions are particularly suitable for, but not limited to, cleaning applications on surfaces within food and beverage industries which may require the use of materials that are acceptable for incidental food/food products/feed contact. Further, the stabilized compositions are particularly suitable for applications requiring materials that are generally regarded as safe (GRAS) or for applications where non-GRAS materials must be minimized. Methods of stabilizing peroxide-containing compositions and methods of using the compositions are also provided.

Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.