Patent classifications
C11D3/44
Articles for cleaning a hard surface
Articles for cleaning debris from a hard surface are described herein, the articles include a hard surface cleaning composition which includes from about 0.1% to about 50% by weight of the composition of a detergent surfactant and a pad including a core and adapted to contact the hard surface. The core comprising up to about 50% cellulosic material. They are high sudsing, have excellent soap scum removal and hard water deposit removal properties and are easy to rinse. A sprayer, methods of use and kits are also disclosed.
Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer
Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less thaadminn 90 wt %, quaternary ammonium salt, and primary amine.
Cleaning agent and method of using the same
A cleaning agent for cleaning grease from a cooking apparatus includes nanoparticles and a chemical composition selected from the group consisting of sodium hydrate, sodium metasilicate, sodium carbonate, polyethylene glycol, surfactant, and combinations thereof. A method of cleaning a cooking apparatus containing used oil includes draining the used oil from the cooking apparatus, placing a cleaning agent in the drained cooking apparatus, filling the cooking apparatus with a predetermined amount of water, boiling the water containing the cleaning agent for a predetermine length of time, and draining the water containing the cleaning agent from the cooking apparatus.
Hard surface cleaning composition and method of improving surface shine using the same
A hard surface cleaning composition, methods of cleaning a hard surface with a low hysteresis composition and disposable premoistened pads for cleaning hard surfaces are provided. The hard surface cleaning composition includes from 0.01 wt. % to 7 wt. % of a solvent selected from the group consisting of a propylene glycol phenyl ether, a dipropylene glycol phenyl ethers and mixtures thereof and at least 92% water. The cleaning composition has a pH from about 3.5 to 9.5 and is free of anionic surfactant and alkanolamine.
Composition for removing resist
Problem to be Solved To provide a composition that can efficiently remove a photoresist adhering to an edge portion and a back surface of a substrate, in a process of producing a mask which is used when the substrate is subjected to etching treatment to have an element, a circuit etc., formed thereon using the photoresist. Solution The composition for removing a resist of the present invention is a composition comprising a surfactant and a solvent, wherein the composition contains, as the surfactant, at least the following component (A). Component (A): a polyglycerol derivative represented by the following formula (a):
R.sup.aO(C.sub.3H.sub.5O.sub.2R.sup.a).sub.nR.sup.a(a)
wherein n represents the number of the repeating units, and is an integer of 2 to 60; and R.sup.a identically or differently represents a hydrogen atom, a C.sub.1-18 hydrocarbon group or a C.sub.2-24 acyl group, provided that at least two of the (n+2) number of R.sup.a are C.sub.1-18 hydrocarbon groups and/or C.sub.2-24 acyl groups.
Azeotropic composition containing 1,1,1,3,3,3-hexafluoro-2-methoxypropane
An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications.
Unit dose detergent compositions
The present invention relates to unit dose detergent compositions comprising a water-soluble container formed from a water-soluble film material enclosing a liquid composition with a relatively high water content. In one embodiment, the unit dose detergent composition comprises a water-soluble container formed from a water-soluble film material enclosing a liquid composition, wherein the liquid composition comprises (a) at least one surfactant, (b) at least one humectant selected from the group consisting of polyols having 3 to 9 carbon atoms, and (c) about 15 wt % to about 35 wt % of water.
Cleaner composition, cleaning aerosol, and method for cleaning contaminated part
The present invention provides a cleaner composition having excellent cleaning properties and appropriate drying properties. The present invention is a cleaner composition including: (A) a hydrofluoroolefin having a boiling point of 30 C. or more and less than 100 C.; and (B) at least one of a perfluoropolyether having a boiling point of 100 C. or more and a hydrofluoroolefin having a boiling point of 100 C. or more, where a mass ratio of the component (A) and the component (B) is 99:1 to 55:45.
Compositions and methods for use in surface decontamination
The disclosure provides compositions and methods for making a colorized solution of an aqueous disinfectant that is both stable in bulk solution and will fade to clear within a predetermined period of time after being applied to a surface, for example as a spray or film. The compositions and methods described here allow an end user to visualize both the extent of coverage and the duration of contact of the disinfectant with the surface, thereby providing more efficient disinfection of the surface.
Substrate detergent composition
The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 4.0% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100 or more.