Patent classifications
C14B1/44
Method of flattening the edges of a swatch of flexible material to be cut
The invention provides a flattening method for flattening the edges of a swatch of flexible material from which pieces are to be cut out. The method comprises: establishing a digital representation of at least a portion of an outline (H.sub.C) of the swatch of flexible material (H); establishing a specific flattening direction (D.sub.i, D.sub.j) and distance (V.sub.i, V.sub.j) for each of the points (P.sub.i, P.sub.j) of the scanned portion of the outline of the swatch; and for each selected point of the scanned portion of the outline of the swatch, using a presser foot of a cutter tool, to flatten the edges of the swatch along the specific flattening direction and distance established for said point, and along a flattening direction going from within the swatch towards its edges.
Method of flattening the edges of a swatch of flexible material to be cut
The invention provides a flattening method for flattening the edges of a swatch of flexible material from which pieces are to be cut out. The method comprises: establishing a digital representation of at least a portion of an outline (H.sub.C) of the swatch of flexible material (H); establishing a specific flattening direction (D.sub.i, D.sub.j) and distance (V.sub.i, V.sub.j) for each of the points (P.sub.i, P.sub.j) of the scanned portion of the outline of the swatch; and for each selected point of the scanned portion of the outline of the swatch, using a presser foot of a cutter tool, to flatten the edges of the swatch along the specific flattening direction and distance established for said point, and along a flattening direction going from within the swatch towards its edges.
SYSTEMS AND METHODS FOR RECONDITIONING LEATHER
A process for preserving and restoring leather upholstery through steps involving use of cleaning, dye, conditioning and sealing materials, and, prior to dying or conditioning, abrading the material, in part, for restoring access to hide pores for optimizing the hide's degree and uniformity of acceptance of dye(s) and conditioner(s).