Patent classifications
C22C27/04
METAL ALLOYS FOR MEDICAL DEVICES
A medical device and a method and process for at least partially forming a medical device, which medical device has improved physical properties.
METAL ALLOYS FOR MEDICAL DEVICES
A medical device and a method and process for at least partially forming a medical device, which medical device has improved physical properties.
Metal powder for additive manufacturing
A metal powder having a composition including the following elements, expressed in content by weight: 6.5%≤Si≤10%, 4.5%≤Nb≤10%, 0.2%≤B≤2.0%, 0.2%≤Cu≤2.0%, C≤2% and optionally containing Ni≤10 wt % and/or Co≤10 wt % and/or Cr≤7 wt % and/or Zr as a substitute for any part of Nb on a one-to-one basis and/or Mo as a substitute for any part of Nb on a one-to-one basis and/or P as a substitute for any part of Si on a one-to-one basis, the balance being Fe and unavoidable impurities resulting from the elaboration, the metal powder having a microstructure including at least 5% in area fraction of an amorphous phase, the balance being made of crystalline ferritic phases with a grain size below 20 μm and possible precipitates, the metal powder having a mean sphericity SPHT of at least 0.80.
Efficient High-Entropy Alloys Design Method Including Demonstration and Software
Embodiments relate to a system for predicting thermodynamic phase of a material. The system includes a phase diagram image scanning processing module configured to scan a binary phase diagram for each material to be used as a component of a high-entropy alloy (HEA). The system includes a feature computation processing module configured to generate a primary feature and an adaptive feature. The primary feature is representative of a probability that the HEA will exhibit a solid solution phase and/or an intermetallic phase. The adaptive feature is representative of a factor favoring formation of a desired intermetallic HEA phase. The system includes a prediction module configured to encode the primary feature and/or the adaptive feature with thermodynamic data associated with formation of HEA alloy phases to provide an output representation of the HEA alloy phases for a material under analysis.
Magnetic Material Sputtering Target and Manufacturing Method Thereof
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object is to provide a magnetic material target, in particular, a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.
Solar Collection Energy Storage and Energy Conversion or Chemical Conversion System
Provided are solar collection energy storage and energy conversion or chemical conversion systems. Also provided are tubing components, such as for solar receivers, including Mo and having a MoSiB coating on an external surface. The systems can include a solar receiver containing a heat transfer material or chemically reacting material and can operate at temperatures of 700° C. or higher. The solar receiver can include tubing components selected from a Mo tubing component, a MAX phase material tubing component, a MoSiB composite tubing component, or a combination thereof. The Mo component, when present, can include a coating on surfaces of the Mo component that operate above 700° C.
METAL WIRE
A metal wire, which is one of a tungsten wire and a tungsten alloy wire, includes alkali metal on the surface thereof. The amount of alkali metal is at most 2.0 μg per 1 g of the metal wire.
METAL WIRE
A metal wire, which is one of a tungsten wire and a tungsten alloy wire, includes alkali metal on the surface thereof. The amount of alkali metal is at most 2.0 μg per 1 g of the metal wire.
Sputtering target
A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.
Sputtering target
A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.