Patent classifications
C22C32/0021
Magnetic Material Sputtering Target and Manufacturing Method Thereof
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object is to provide a magnetic material target, in particular, a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.
SPUTTERING TARGET FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUM
Provided is a sputtering target to be used for forming a granular magnetic thin film in which FePt magnetic grains are isolated by an oxide and which constitutes a heat-assisted magnetic recording medium having enhanced uniaxial magnetic anisotropy, thermal stability, and SNR (signal-to-noise ratio).
The sputtering target for a heat-assisted magnetic recording medium contains an FePt alloy and a nonmagnetic material as main components, where the nonmagnetic material is an oxide having a melting point of 800° C. or higher and 1100° C. or lower.
Ceramic composite material
A process for manufacturing ceramic-metal composite material, comprises dissolving ceramic powder into water to obtain an aqueous solution of ceramic; mixing metal powder having a multimodal particle size where largest particle size is one fourth of the minimum dimension of a device, with the aqueous solution of ceramic to obtain a powder containing ceramic precipitated on the surface of metal particles; mixing the powder containing ceramic precipitated on the surface of the metal particles, with ceramic powder having a particle size below 50μ.Math.τ.Math., to obtain a powder mixture; adding saturated aqueous solution of ceramic to the powder mixture to obtain an aqueous composition containing ceramic and metal; compressing the aqueous composition to form a disc of ceramic-metal composite material containing ceramic and metal; and removing water from the ceramic-metal composite material; wherein ceramic content of the disc is 10 vol-% to 35 vol-%. Alternatively, ceramic-ceramic composite material may be manufactured.
CATHODE MEMBER FOR ELECTRON BEAM GENERATION, AND METHOD FOR MANUFACTURING THE SAME
The cathode member for electron beam generation of the present disclosure includes: 95% by area or more of a single phase or two phases of a compound composed of iridium and cerium. A total content of one or more subcomponents of metallic iridium and an oxide of one or more elements of iridium and cerium is 5% by area or less of the cathode member.
COMPOSITE MATERIAL AND HEAT DISSIPATION MEMBER
A composite material including a metallic phase and plurality of particles dispersed in the metallic phase. The plurality of particles is a carbon-based material; the metallic phase contains a main element, a first element, and a second element; the coating layer of each of the plurality of particles is carbide of the second element. The main element is copper; the first element is a metallic element having a lower surface tension than copper; the second element is at least one selected from the group consisting of beryllium, silicon, titanium, chromium, zirconium, niobium, hafnium, and tantalum.
DC HIGH-VOLTAGE RELAY, AND CONTACT MATERIAL FOR DC HIGH-VOLTAGE RELAY
A DC high-voltage relay with at least one contact pair including a movable contact and a fixed contact, the contact pair having a contact force and/or an opening force of 100 gf or more, having a rated voltage of 48 V or more, the movable contact and/or the fixed contact includes a Ag oxide-based contact material. Metal components contain at least one metal M essentially containing Zn, and a balance being Ag and inevitable impurity metals, and the contact material has a content of the metal M of 0.2% by mass or more and 8% by mass or less based on a total mass. The contact material has a material structure in which one or more oxides of the metal M having an average particle size of 0.01 μm or more and 0.4 μm or less are dispersed in a matrix including Ag or a Ag alloy.
Nano dispersion copper alloy with high air-tightness and low free oxygen content and brief manufacturing process thereof
Disclosed is a nano dispersion copper alloy with high air-tightness and low free oxygen content and a brief manufacturing process thereof, wherein alloy comprises the following components: Al.sub.2O.sub.3, Ca and La. The manufacturing process comprises the following steps of: preparing Cu—Al.sub.2O.sub.3 alloy powder by an internal oxidation method; mixing the Cu—Al.sub.2O.sub.3 alloy powder with Cu—Ca—La alloy powder; sheathing the mixed powder under protection of argon; performing hot extrusion and then rotary forging; vacuumizing the sheath after the rotary forging; and sealing and placing the sheath in a nitrogen atmosphere with a temperature of 450° C. to 550° C. and a pressure intensity of 40 Mpa to 60 Mpa for 3 hours to 5 hours. The dispersion copper prepared by the present disclosure has the advantages of low free oxygen content (≤15 ppm), high dimensional stability, good air-tightness and an air leakage rate≤1.0×10.sup.−10 Pa m.sup.3/s after hydrogen annealing.
CERAMIC COMPOSITE MATERIAL
A process for manufacturing ceramic-metal composite material, comprises dissolving ceramic powder into water to obtain an aqueous solution of ceramic; mixing metal powder having a multimodal particle size where largest particle size is one fourth of the minimum dimension of a device, with the aqueous solution of ceramic to obtain a powder containing ceramic precipitated on the surface of metal particles; mixing the powder containing ceramic precipitated on the surface of the metal particles, with ceramic powder having a particle size below 50 μm, to obtain a powder mixture; adding saturated aqueous solution of ceramic to the powder mixture to obtain an aqueous composition containing ceramic and metal; compressing the aqueous composition to form a disc of ceramic-metal composite material containing ceramic and metal; and removing water from the ceramic-metal composite material; wherein ceramic content of the disc is 10 vol-% to 35 vol-%. Alternatively, ceramic-ceramic composite material may be manufactured.
Sintered friction material for railway vehicles and method for producing the same
There is provided a sintered friction material for railway vehicles that has excellent frictional properties and wear resistance even in a high speed range of 280 km/hour or more. The sintered friction material for railway vehicles is a green compact sintered material containing, in mass %, Cu: 50.0 to 75.0%, graphite: 5.0 to 15.0%, one or more selected from the group consisting of magnesia, zircon sand, silica, zirconia, mullite, and silicon nitride: 1.5 to 15.0%, one or more selected from the group consisting of W and Mo: 3.0 to 30.0%, and one or more selected from the group consisting of ferrochromium, ferrotungsten, ferromolybdenum, and stainless steel: 2.0 to 20.0%, with the balance being impurities.
Magnetic material sputtering target and manufacturing method thereof
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object of the present invention is to provide a magnetic material target, in particular a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.