C22F1/14

Producing method for gold sputtering target and producing method for gold film

A production method for a gold sputtering target includes: producing a gold sputtering target which is made of gold and inevitable impurities and in which an average value of Vickers hardness is 40 or more and 60 or less, an average value of crystal grain size is 15 μm or more and 200 μm or less, and the {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.

Producing method for gold sputtering target and producing method for gold film

A production method for a gold sputtering target includes: producing a gold sputtering target which is made of gold and inevitable impurities and in which an average value of Vickers hardness is 40 or more and 60 or less, an average value of crystal grain size is 15 μm or more and 200 μm or less, and the {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.

Polyelemental heterostructure nanoparticles and methods of making the same
11591449 · 2023-02-28 · ·

Disclosed herein are method and design rules for making polyelemental systems with specific heterostructures, including tetra-phase nanopartides with as many as six junctions. In accordance with an embodiment, a method of making a tetra-phase polyelemental nanoparticle using tri-phase nanoparticle architectures can include selecting two or more triphase nanoparticle architectures, wherein the two or more tri-phase nanoparticle architectures are one or more striped tri-phase architectures, one or more pie-shaped tri-phase architectures, or combinations thereof; identifying from the selected two or more tri-phase nanoparticle architectures groups of metals for generating each of the two or more tri-phase nanoparticle architectures; contacting a tip coated with an ink to a substrate to form a nanoreactor, the ink comprising block copolymer and the metals from the groups of metals identified for generating each of the two or more tri-phase nanoparticle architectures; and annealing the nanoreactors under conditions sufficient to synthesize a tetra-phase polyelemental nanoparticle.

Gold sputtering target

A gold sputtering target is made of gold and inevitable impurities, and has a surface to be sputtered. In the gold sputtering target, an average value of Vickers hardness is 40 or more and 60 or less, and an average crystal grain size is 15 μm or more and 200 μm or less. A {110} plane of gold is preferentially oriented at the surface to be sputtered.

Gold sputtering target and method for producing the same

A gold sputtering target has a gold purity of 99.999% or more. In such a gold sputtering target, an average value of Vickers hardness is 20 or more and less than 40, an average crystal grain size is 15 μm or more and 200 μm or less, and a {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.

Exothermically responsive cathodes and methods of production thereof
11563217 · 2023-01-24 · ·

A method of producing electrodes includes selecting a palladium alloy, annealing the palladium alloy at a first temperature above 350° C., cold working the palladium alloy into a desired electrode shape, and annealing the palladium alloy at a second temperatures and for a time sufficient to produce a grain size between about 5 microns and about 100 microns. The method further includes etching the palladium alloy, rinsing the palladium alloy with at least one of water and heavy water, and storing the palladium alloy in an inert environment.

Exothermically responsive cathodes and methods of production thereof
11563217 · 2023-01-24 · ·

A method of producing electrodes includes selecting a palladium alloy, annealing the palladium alloy at a first temperature above 350° C., cold working the palladium alloy into a desired electrode shape, and annealing the palladium alloy at a second temperatures and for a time sufficient to produce a grain size between about 5 microns and about 100 microns. The method further includes etching the palladium alloy, rinsing the palladium alloy with at least one of water and heavy water, and storing the palladium alloy in an inert environment.

Medical Pt alloy wire and medical Pt alloy coil

The present invention is drawn to a medical Pt alloy wire, made of a Pt—W alloy containing 10% by mass or more and 15% by mass or less of W, a balance of Pt, and inevitable impurities. The Pt alloy wire has Vickers hardness of 400 Hv or more and 600 Hv or less, and has hardness and strength superior to those of a conventional Pt alloy wire having the same composition. The Pt alloy wire of the present invention has properties preferable as a coil applied to an embolic coil or a guide wire or the like, and is also good in workability in secondary processing for producing such a medical tool.

MEDICAL Pt-W ALLOY

The present invention relates to a medical Pt—W alloy, containing 10 mass % or more and 15 mass % or less of W, with the balance being Pt and inevitable impurities, in which a Zr content is 1000 ppm or less. Limiting the Zr content can improve workability, particularly workability at the stage of hot working. Regarding impurity control, further limiting a Ca content to 250 ppm or less can provide more suitable workability. The present invention is good in workability in processing into a wire included in an embolic coil, a guide wire or the like.