C23C14/024

METHOD OF DEPOSITING A MATERIAL

A method of manufacturing an electronic component including a substrate is provided. The method includes generating a plasma remote from a sputter target, generating sputtered material from the sputter target using the plasma, and depositing the sputtered material on a substrate as a crystalline layer.

GAS BARRIER LAMINATE, PACKAGING MEMBER, PACKAGING BAG, AND TUBULAR CONTAINER

A gas barrier laminate including: a substrate layer which contains a polyolefin resin; a metal oxide-containing layer which contains a metal oxide; and an overcoat layer which contains a polyvinyl alcohol resin, the overcoat layer having a surface, the overcoat layer having a surface which has a softening temperature of 100 to 170° C., as measured by local thermal analysis.

METHOD AND APPARATUS FOR DEPOSITION OF PIEZO-ELECTRIC MATERIALS
20230009085 · 2023-01-12 ·

Examples disclosed herein relate to an apparatus and method of forming thin film layers on a substrate. A first piezoelectric material layer is deposited on the substrate in a first chamber. The first piezoelectric material layer is formed on the substrate while the substrate is at a first temperature. A second piezoelectric material layer is deposited on the first piezoelectric material layer after cooling the substrate to a second temperature. The second temperature is lower than the first temperature. The first piezoelectric material layer and the second piezoelectric material layer both comprise a first piezoelectric material.

Multi-layered coating system for a substrate and method of making the same

A multi-layered coating system for a substrate and a method for preparing the multi-layered coating system are provided herein. The multi-layered coating system includes a substrate, a metallic layer disposed adjacent to at least a portion of the substrate, an adhesion layer disposed adjacent to at least a portion of the metallic layer, and a protective coating layer disposed adjacent to at least a portion of the adhesion layer. The metallic layer includes a metal, an oxide of the metal, or a combination thereof. The adhesion layer includes a silicate and latex.

METHOD AND DEVICE FOR PRODUCING LAYERED NANOCARBON STRUCTURES
20230009488 · 2023-01-12 ·

Methods for producing layered nanocarbon structures placing a workpiece in a working chamber, applying a vacuum to the chamber, processing the workpiece surface with gas ions, applying a material sublayer to the workpiece surface, depositing carbon ions from a carbon plasma on the workpiece surface to apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface. The methods include irradiating the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a graphite sp2 carbon coating layer on the sp3 carbon coating layer and irradiating the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a linear chain and polymer sp1 carbon coating layer on the sp2 carbon coating layer.

LOW-E MATERIAL COMPRISING A THICK LAYER BASED ON SILICON OXIDE
20230212065 · 2023-07-06 ·

A material includes a transparent substrate coated with a stack including at least one functional metal layer based on silver and at least two dielectric coatings, each dielectric coating including at least one dielectric layer, in such a way that each functional metal layer is positioned between two dielectric coatings, wherein the stack includes a layer based on silicon oxide having a thickness of greater than or equal to 12 nm located directly in contact with the substrate.

FORMING LINED COOLING APERTURE(S) IN A TURBINE ENGINE COMPONENT

A manufacturing method is provided. During this method, a preform component is provided for a turbine engine. The preform component includes a substrate. A meter section of a cooling aperture is formed in the substrate. An internal coating is applied onto a surface of the meter section. An external coating is applied over the substrate. A diffuser section of the cooling aperture is formed in the external coating and the substrate to provide the cooling aperture.

Sliding member
11692248 · 2023-07-04 · ·

To provide a sliding member, such as a piston ring for an internal combustion engine, having low friction and excellent toughness. The above-described problem is solved by a sliding member (10) such as a piston ring coated with a Cr—B—Ti—V—(Mn, Mo)—N-based alloy film (2) on a sliding surface (11) thereof, and configured so that the alloy film (2) contains one or both of Mn and Mo and has a total content of the Mn and the Mo within a range of 2 mass % or less. Preferably, a B content is within a range of 0.1 mass % to 1.5 mass %, inclusive, a V content is within a range of 0.05 mass % to 1 mass %, inclusive, and a Ti content is within a range of 0.05 mass % to 1.5 mass %, inclusive.

ANTI-MICROBIAL COATING PHYSICAL VAPOR DEPOSITION SUCH AS CATHODIC ARC EVAPORATION
20230002881 · 2023-01-05 ·

A bioactive coated substrate includes a base substrate, a first interlayer disposed over the base substrate, an outermost bioactive layer disposed on the first interlayer, and a topcoat layer disposed on the outermost bioactive layer. Characteristically, a plurality of microscopic openings extending through the topcoat layer and the outermost bioactive layer expose the first interlayer and the outermost bioactive layer. A method for forming the bioactive coated substrate is also provided.

TiCN having reduced growth defects by means of HiPIMS

A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas; preferably argon, and at least nitrogen gas as the reactive gas, wherein: the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferably CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere having only nitrogen gas as the reactive gas, wherein the Ti targets are preferably operated by means of a first power supply device or a first power supply unit and the graphite targets are operated with pulsed power by means of a second power supply device or a second power supply unit.