Methods of modulating flow during vapor jet deposition of organic materials are provided. A method may include ejecting a vapor entrained in a delivery gas from a nozzle onto a substrate upon which the vapor condenses. A confinement gas may be provided that has a flow direction opposing a flow direction of the delivery gas ejected from the nozzle. A vacuum source may be provided that is adjacent to a delivery gas aperture of the nozzle. The method may include adjusting, by an actuator, a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target.

A gas ring for a PVD-source with a cathode having a target for material deposition. The gas ring includes an inner rim and an outer rim and at least one flange between the inner and the outer rim. The gas ring further includes: —a gas inlet; —gas openings arranged circumferentially in or near the inner rim; —at least one circumferential gas channel connected to the gas inlet and/or the gas openings; —a cooling duct.

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of sequentially ordered deposition chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A substrate fixture contains a substrate. The substrate fixture comprises a fixture frame. The fixture frame is defined by multiple circular members adjacently joined in a circular arrangement. Each circular member has a fixture frame opening sized to receive the substrate. Lens support arms may integrate into the circular members, extending in a curved disposition into the fixture frame opening to retain the substrate. A deposition method is also disclosed.

Embodiments of the disclosed subject matter provide a system having at least one carrier gas source, at least one heated container that includes organic material, and a jet array print head that includes a plurality of apertures to print lines on a substrate, and that is connected to a vacuum source. The system includes a pair of gas bearing plates, with a top gas bearing plate and a bottom gas bearing plate, each having a plurality of pressure apertures and vacuum apertures. The top gas bearing plate applies a uniform force to a top surface of the substrate, and the bottom gas bearing plate applies a uniform force to a bottom surface of the substrate. The top gas bearing plate includes a slot configured for the print head to fit within. The vacuum apertures are arranged perpendicular to a direction of travel of the substrate.

An organic vapor deposition device comprises a print head, comprising a source channel, in fluid communication with a flow of carrier gas and a quantity of organic source material configured to mix with the carrier gas, a nozzle having a deposition outlet, in fluid communication with the source channel, and a shutter configured at least to open and close the deposition outlet, wherein the print heat is configured to allow the flow of carrier gas and the organic source material exit the deposition outlet when the shutter is in an open position, and to prevent the flow of carrier gas and the organic source material from exiting the deposition outlet when the shutter is in a closed position. A method of manufacturing a device comprising an organic feature on a substrate is also described.

One or more embodiments described herein generally relate to methods and systems for forming films on substrates in semiconductor processes. In embodiments described herein, process chamber is provided that includes a lid plate having a plurality of cooling channels formed therein, a pedestal, the pedestal having a plurality of cooling channels formed therein, and a showerhead, wherein the showerhead comprises a plurality of segments and each segment is at least partially surrounded by a shield.

A deposition device including an injection block and a print die is provided, which allows for vertical movement of the injection block while still maintaining connection between the print die and external gas sources. Also disclosed is an injection block suitable for such devices, which provides improved vertical range of motion and thermal consistency compared to conventional injection block devices.

The invention relates to a method for the production of materials. In particular the invention relates to nanostructured materials, and an apparatus and method for the production thereof. In accordance with the invention, nanostructured materials are produced by the subsequent steps of producing nanoparticles; transporting the nanoparticles into, and optionally through, a porous carrier by a gas flow; and depositing the nanoparticles onto the surface of said porous carrier in an essentially isotropic manner.

A thin-film system comprising a microplasma region where sputtered particles are formed, a power supply that supplies power to the microplasma region, gas flow hardware to regulate flow of gas to the microplasma region, a deposition nozzle that forms a thin film on a substrate and a supply line for supplying sputtered particles to the deposition nozzle, wherein the microplasma region is decoupled from the deposition nozzle.

Solid films and articles having a surface with discrete regions patterned with a deposited low molecular weight organic compound, such as pharmaceutical actives and new chemical entities, are provided. The organic compound may be present at ≥ about 99 mass % in the one or more discrete regions and may be crystalline or amorphous. The deposited organic compound may be deposited as a film having high surface area. The deposited organic compound exhibits enhanced solubility and bioavailability, by way of non-limiting example. Methods of organic vapor jet printing deposition method of such a low molecular weight organic compound in an inert gas stream are also provided.