A device may include one or more memories and one or more processors, communicatively coupled to the one or more memories, to receive design information, wherein the design information identifies desired values for a set of layers of an optical element to be generated during one or more runs; receive or obtain historic information identifying a relationship between a parameter for the one or more runs and an observed value relating to the one or more runs or the optical element; determine layer information for the one or more runs based on the historic information, wherein the layer information identifies run parameters, for the set of layers, to achieve the desired values; and cause the one or more runs to be performed based on the layer information.

A device may include one or more memories and one or more processors, communicatively coupled to the one or more memories, to receive design information, wherein the design information identifies desired values for a set of layers of an optical element to be generated during one or more runs; receive or obtain historic information identifying a relationship between a parameter for the one or more runs and an observed value relating to the one or more runs or the optical element; determine layer information for the one or more runs based on the historic information, wherein the layer information identifies run parameters, for the set of layers, to achieve the desired values; and cause the one or more runs to be performed based on the layer information.

A method is for manufacturing materials for electrochemical energy storage devices. A deposition method based on laser ablation is utilised in the manufacturing of at least one material layer including lithium. The process is controlled using measurement information that is obtained from the spectrum of the electromagnetic radiation generated by laser ablation. A roll-to-roll method can be used in the deposition, in which the substrate (15, 32, 44, 64, 75, 85) to be coated is directed from one roll (31a) to the second roll (31 b), and the deposition takes place in the area between the rolls (31a-b). In addition, turning and/or moving mirrors (21) can be used to direct laser beam (12, 41, 71a-d, 81a-d) as a beam line array (23) to the surface of the target (13, 42a-b, 72a-d, 82a-d, 82A-D).

A method is for manufacturing materials for electrochemical energy storage devices. A deposition method based on laser ablation is utilised in the manufacturing of at least one material layer including lithium. The process is controlled using measurement information that is obtained from the spectrum of the electromagnetic radiation generated by laser ablation. A roll-to-roll method can be used in the deposition, in which the substrate (15, 32, 44, 64, 75, 85) to be coated is directed from one roll (31a) to the second roll (31 b), and the deposition takes place in the area between the rolls (31a-b). In addition, turning and/or moving mirrors (21) can be used to direct laser beam (12, 41, 71a-d, 81a-d) as a beam line array (23) to the surface of the target (13, 42a-b, 72a-d, 82a-d, 82A-D).

A method is provided. The method includes the following steps: introducing a first physical vapor deposition (PVD) target and a second PVD target in a PVD system, the first PVD target containing a boron-containing cobalt iron alloy (FeCoB) with an initial boron concentration, and the second PVD target containing boron; determining parameters of the PVD system based on a target boron concentration larger than the initial boron concentration; and depositing a FeCoB film on a substrate according to the parameters of the PVD system.

A method comprises: forming a first layer stack on a first substrate by means of a multiplicity of coating processes, each coating process of which forms at least one layer of the first layer stack; detecting an optical spectrum of the first layer stack; determining correction information for at least one coating process of the multiplicity of coating processes using a model, wherein the model provides a right-unique mapping function between a deviation of the spectrum from a desired spectrum and the correction information; and changing at least one control parameter for controlling the at least one coating process of the multiplicity of coating processes using the correction information; and forming a second layer stack on the first or a second substrate by means of the multiplicity of coating processes using the changed control parameter, each coating process of which forms at least one layer of the second layer stack.

In some examples, a Vacuum Pre-treatment Module (VPM) metrology system is provided for measuring a sheet resistance of a layer on a substrate. The system may comprise an eddy sensor including a sender sensor and a receiver sensor defining a gap between them for accepting an edge of a substrate to be tested. A sensor controller receives measurement signals from the eddy sensor. A data processor processes the measurement signals and generates sheet resistance values for the layer on the substrate.

In some examples, a Vacuum Pre-treatment Module (VPM) metrology system is provided for measuring a sheet resistance of a layer on a substrate. The system may comprise an eddy sensor including a sender sensor and a receiver sensor defining a gap between them for accepting an edge of a substrate to be tested. A sensor controller receives measurement signals from the eddy sensor. A data processor processes the measurement signals and generates sheet resistance values for the layer on the substrate.

A sputtering system includes a vacuum chamber, a power source having a pole coupled to a backing plate for holding a sputtering target within the vacuum chamber, a pedestal for holding a substrate within the vacuum chamber, and a time of flight camera positioned to scan a surface of a target held to the backing plate. The time of flight camera may be used to obtain information relating to the topography of the target while the target is at sub-atmospheric pressure. The target information may be used to manage operation of the sputtering system. Managing operation of the sputtering system may include setting an adjustable parameter of a deposition process or deciding when to replace a sputtering target. Machine learning may be used to apply the time of flight camera data in managing the sputtering system operation.

An apparatus for laser deposition with a reactive gas includes a source, a target, and a substrate. The source emits a plasma jet of the reactive gas. The target generates a plasma plume of a deposition material when a laser beam ablates the target. The substrate collects a film resulting from a chemical reaction between the deposition material from the plasma plume and the reactive gas from the plasma jet. Correspondingly, a method for laser deposition with a reactive gas includes steps of emitting a plasma jet of the reactive gas, ablating a target with a laser beam, and collecting a film on a substrate. The plasma jet emits from an orifice of a source. Ablating the target generates a plasma plume of a deposition material. The film results from a chemical reaction between the deposition material from the plasma plume and the reactive gas from the plasma jet.