Patent classifications
C23G3/04
Method of Treating an Apparatus to Remove Surface Deposits
A method of treating an apparatus to remove surface deposits therefrom is performed by selecting a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less that exhibit properties of Brownian motion that facilitate penetration of solid deposits on surfaces of an apparatus that is subject to surface deposits from contact with fluids. The surfaces of the apparatus are contacted with a treatment composition comprising the colloidal particle dispersion. The composition is allowed to act upon the materials adhering to the surfaces of the apparatus to loosen and breakup the materials adhering to the surfaces of the apparatus. The loosened and broken materials are removed from the surfaces of the apparatus.
Method of cleaning pipeline
A method of cleaning a pipeline is performed by introducing a treatment composition comprising a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less into an interior of a pipeline to be cleaned. A pig or body is passed through the pipeline to spread the composition upon surfaces of the interior of the pipeline. The composition and materials adhering to the surfaces of the interior of the pipeline are removed to facilitate cleaning of the pipeline.
Method of Cleaning Pipeline
A method of cleaning a pipeline is performed by introducing a treatment composition comprising a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less into an interior of a pipeline to be cleaned. A pig or body is passed through the pipeline to spread the composition upon surfaces of the interior of the pipeline. The composition and materials adhering to the surfaces of the interior of the pipeline are removed to facilitate cleaning of the pipeline
Method of Cleaning Pipeline
A method of cleaning a pipeline is performed by introducing a treatment composition comprising a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less into an interior of a pipeline to be cleaned. A pig or body is passed through the pipeline to spread the composition upon surfaces of the interior of the pipeline. The composition and materials adhering to the surfaces of the interior of the pipeline are removed to facilitate cleaning of the pipeline
Method of cleaning pipeline
A method of cleaning a pipeline is performed by introducing a treatment composition comprising a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less into an interior of a pipeline to be cleaned. A pig or body is passed through the pipeline to spread the composition upon surfaces of the interior of the pipeline. The composition and materials adhering to the surfaces of the interior of the pipeline are removed to facilitate cleaning of the pipeline.
Ultrasonic cleaning equipment and ultrasonic cleaning method
An ultrasonic cleaning equipment (1) according to the present invention includes a treatment tank (10) that stores a cleaning liquid that cleans an object to be cleaned and in which the object to be cleaned is immersed; an ultrasonic application mechanism (20) that applies ultrasonic waves to the cleaning liquid retained in an interior of the treatment tank; and a curved surface member (30) that is located in a range defined by an angle of inclination from a perpendicular direction in an end portion of a vibrating surface of the ultrasonic application mechanism to an outside with respect to the vibrating surface and that is held on a wall surface and/or a bottom surface of the treatment tank.
ULTRASONIC CLEANING EQUIPMENT AND ULTRASONIC CLEANING METHOD
To make ultrasonic waves can be propagated with better efficiency throughout the entirety of a treatment tank, and an object to be cleaned can be cleaned with better efficiency regardless of the type of the object to be cleaned.
An ultrasonic cleaning equipment (1) according to the present invention includes a treatment tank (10) that stores a cleaning liquid that cleans an object to be cleaned and in which the object to be cleaned is immersed; an ultrasonic application mechanism (20) that applies ultrasonic waves to the cleaning liquid retained in an interior of the treatment tank; and a curved surface member (30) that is located in a range prescribed by a prescribed angle of inclination from a normal direction in an end portion of a vibrating surface of the ultrasonic application mechanism to an outside with respect to the vibrating surface and that is held on a wall surface and/or a bottom surface of the treatment tank. The curved surface member has a convex curved surface (31) in which at least a convex curved part (33) having a surface shape of a spherical surface or an aspherical surface exists and the convex curved part is in a state of protruding more on a side of the vibrating surface than a portion other than the convex curved part does, and the convex curved surface is held in a state of facing the vibrating surface in such a manner that at least part of first sound waves that are sound waves that are applied from the ultrasonic application mechanism and that have not experienced reflection arrive at the convex curved part of the convex curved surface.
CYLINDER PROCESSING DEVICE
A processing apparatus for a plurality of cylinders that includes a superstructure having a support frame and a rotary structure mounted to the support frame for rotation about a rotational axis. The rotary structure includes a plurality of cylinder stations, angularly spaced about the rotational axis, each configured, in use, to receive a cylinder a plurality of restraining arms, each restraining arm corresponding to a respective cylinder station, and a locking mechanism coupled to the plurality of restraining arms. Each restraining arm is moveable between a closed configuration and an open configuration. In the closed configuration the restraining arm contacts a cylinder received on the corresponding cylinder station to restrain the cylinder on the cylinder station. In the open configuration, the restraining arm is retracted away from said cylinder received on the corresponding cylinder station such that a cylinder can be removed from the cylinder station or placed on the cylinder station. The locking mechanism has an unlocked configuration and a locked configuration. In the unlocked configuration movement of the plurality of restraining arms between said closed and open configurations is possible. In the locked configuration, movement of the plurality of restraining arms from said closed configuration to said open configuration is prevented by the locking mechanism.
CYLINDER PROCESSING DEVICE
A processing apparatus for a plurality of cylinders that includes a superstructure having a support frame and a rotary structure mounted to the support frame for rotation about a rotational axis. The rotary structure includes a plurality of cylinder stations, angularly spaced about the rotational axis, each configured, in use, to receive a cylinder a plurality of restraining arms, each restraining arm corresponding to a respective cylinder station, and a locking mechanism coupled to the plurality of restraining arms. Each restraining arm is moveable between a closed configuration and an open configuration. In the closed configuration the restraining arm contacts a cylinder received on the corresponding cylinder station to restrain the cylinder on the cylinder station. In the open configuration, the restraining arm is retracted away from said cylinder received on the corresponding cylinder station such that a cylinder can be removed from the cylinder station or placed on the cylinder station. The locking mechanism has an unlocked configuration and a locked configuration. In the unlocked configuration movement of the plurality of restraining arms between said closed and open configurations is possible. In the locked configuration, movement of the plurality of restraining arms from said closed configuration to said open configuration is prevented by the locking mechanism.
Descaling system for heat exchange equipment
A system for descaling heat exchanger surfaces using a varying concentration of either an acidic or alkaline solution, selecting an optimum pH value for descaling a heat exchanger according to the level of cleaning the heat exchanger requires, monitoring pH value of descaling solution during circulation through a heat exchanger, and adding chemical solution to achieve coincidence of optimum and monitored pH values during descaling operation.