An electrodeposition coating method includes a degreasing/cleaning step, a chemical conversion step, and an electrodeposition coating layer formation step. The degreasing/cleaning step includes a degreasing step of ultrasonically vibrating a degreasing solution in which a target object is immersed, using an ultrasonic vibrator. The electrodeposition coating layer formation step includes: a first electrodeposition step; a first rinsing step; a rinse water removal/reduction step of removing or reducing rinse water on a rinse water stagnating surface of the target object; a thermal flow step of allowing the first electrodeposition coating film to thermally flow so that the first electrodeposition coating film formed on a portion of the target object near a first counter electrode has a higher electrical resistance than the first electrodeposition coating film formed on a portion of the target object far from the first counter electrode; and a second electrodeposition step.

An electrodeposition coating method includes a degreasing/cleaning step, a chemical conversion step, and an electrodeposition coating layer formation step. The degreasing/cleaning step includes a degreasing step of ultrasonically vibrating a degreasing solution in which a target object is immersed, using an ultrasonic vibrator. The electrodeposition coating layer formation step includes: a first electrodeposition step; a first rinsing step; a rinse water removal/reduction step of removing or reducing rinse water on a rinse water stagnating surface of the target object; a thermal flow step of allowing the first electrodeposition coating film to thermally flow so that the first electrodeposition coating film formed on a portion of the target object near a first counter electrode has a higher electrical resistance than the first electrodeposition coating film formed on a portion of the target object far from the first counter electrode; and a second electrodeposition step.

The invention relates to the field of liquid phase synthesis of diamond or any other allotropic forms of carbon and more particularly to a process of liquid phase synthesis of carbonaceous films, according to which a voltage is applied, in a solution containing carbonaceous molecules, to a substrate on which a carbonaceous layer is to be deposited and photons are sent to the surface of the substrate. To this end, the invention also relates to a device for the liquid phase synthesis of carbonaceous films comprising a synthesis vessel inside which are arranged means for applying a voltage in a reaction zone, and photonic means are arranged to send photons to the reaction zone.

The invention relates to the field of liquid phase synthesis of diamond or any other allotropic forms of carbon and more particularly to a process of liquid phase synthesis of carbonaceous films, according to which a voltage is applied, in a solution containing carbonaceous molecules, to a substrate on which a carbonaceous layer is to be deposited and photons are sent to the surface of the substrate. To this end, the invention also relates to a device for the liquid phase synthesis of carbonaceous films comprising a synthesis vessel inside which are arranged means for applying a voltage in a reaction zone, and photonic means are arranged to send photons to the reaction zone.

An electrodeposition bath, water-washing baths, a first filtration membrane which feeds filtrate and concentrated-solution obtained by filtering electrodeposition-solution in the electrodeposition bath to the water-washing bath in a last stage and the electrodeposition bath, a feed system that feeds filtrate-water obtained by performing ultrafiltration or microfiltration on water after water-washing in the water-washing bath, a second filtration membrane which feeds filtrate and concentrated-solution obtained by filtering the filtrate-water fed by the feed system to the water-washing bath in the last stage and one of the electrodeposition bath and a water-washing bath other than the water-washing bath in the last stage, respectively, and a flow rate adjustment unit that adjusts a feed amount of each of the filtrate obtained by filtration by the first filtration membrane and the filtrate obtained by filtration by the second filtration membrane to the water-washing bath in the last stage are included.

An electrodeposition bath, water-washing baths, a first filtration membrane which feeds filtrate and concentrated-solution obtained by filtering electrodeposition-solution in the electrodeposition bath to the water-washing bath in a last stage and the electrodeposition bath, a feed system that feeds filtrate-water obtained by performing ultrafiltration or microfiltration on water after water-washing in the water-washing bath, a second filtration membrane which feeds filtrate and concentrated-solution obtained by filtering the filtrate-water fed by the feed system to the water-washing bath in the last stage and one of the electrodeposition bath and a water-washing bath other than the water-washing bath in the last stage, respectively, and a flow rate adjustment unit that adjusts a feed amount of each of the filtrate obtained by filtration by the first filtration membrane and the filtrate obtained by filtration by the second filtration membrane to the water-washing bath in the last stage are included.

The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F. The wash water recycling line 5 feeds, to the post-chemical-conversion rinse section D, the wash water W after being subjected to the filtration process in the filtration process apparatus 4 as wash water W to be used to wash an object to be coated in the post-chemical-conversion rinse section D.

The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F. The wash water recycling line 5 feeds, to the post-chemical-conversion rinse section D, the wash water W after being subjected to the filtration process in the filtration process apparatus 4 as wash water W to be used to wash an object to be coated in the post-chemical-conversion rinse section D.

Described herein is a method for cleaning an electrocoating bath in a continuous facility, where a skid connected to a conveying installation is conveyed through the electrocoating bath, and where the skid includes a filter medium; the filter medium is secured on the skid via at least one movable connecting element; the movable connecting element allows the orientation of the filter medium at the interface between electrocoating bath and air; and, after immersion of the skid into the electrocoating bath, during the conveying of the skid through the electrocoating bath, the filter medium is oriented at the interface between electrocoating bath and air and is drawn along the surface of the electrocoating bath. Also described herein is a skid for use in the cleaning method.

Described herein is a method for cleaning an electrocoating bath in a continuous facility, where a skid connected to a conveying installation is conveyed through the electrocoating bath, and where the skid includes a filter medium; the filter medium is secured on the skid via at least one movable connecting element; the movable connecting element allows the orientation of the filter medium at the interface between electrocoating bath and air; and, after immersion of the skid into the electrocoating bath, during the conveying of the skid through the electrocoating bath, the filter medium is oriented at the interface between electrocoating bath and air and is drawn along the surface of the electrocoating bath. Also described herein is a skid for use in the cleaning method.