Patent classifications
D05C9/18
SEWING MACHINE
The present invention provides a sewing machine enabling to sew a high-quality pattern without using an embroidery frame. In a sewing machine 1, a pattern is sewn while a fabric 100 is fed in a sewing direction by a feed dog 2a. The sewing machine 1 has a fabric guide 14. The fabric guide 14 has a guide portion 16 which extends straight in a sewing direction to serve as a basis of a cloth feed in an amplitude direction of the needle. The carriage 10 makes the fabric guide 14 slide in the amplitude direction of the needle by a predetermined distance. Thus, the guide portion 16 serves as an index of the position of the fabric 100 to be located for sewing the next pattern line. Since the fabric 100 can be accurately located for sewing the next pattern line, high-quality pattern can be sewn.
SEWING MACHINE
The present invention provides a sewing machine enabling to sew a high-quality pattern without using an embroidery frame. In a sewing machine 1, a pattern is sewn while a fabric 100 is fed in a sewing direction by a feed dog 2a. The sewing machine 1 has a fabric guide 14. The fabric guide 14 has a guide portion 16 which extends straight in a sewing direction to serve as a basis of a cloth feed in an amplitude direction of the needle. The carriage 10 makes the fabric guide 14 slide in the amplitude direction of the needle by a predetermined distance. Thus, the guide portion 16 serves as an index of the position of the fabric 100 to be located for sewing the next pattern line. Since the fabric 100 can be accurately located for sewing the next pattern line, high-quality pattern can be sewn.
Sewing machine
The present invention provides a sewing machine enabling to sew a high-quality pattern without using an embroidery frame. In a sewing machine 1, a pattern is sewn while a fabric 100 is fed in a sewing direction by a feed dog 2a. The sewing machine 1 has a fabric guide 14. The fabric guide 14 has a guide portion 16 which extends straight in a sewing direction to serve as a basis of a cloth feed in an amplitude direction of the needle. The carriage 10 makes the fabric guide 14 slide in the amplitude direction of the needle by a predetermined distance. Thus, the guide portion 16 serves as an index of the position of the fabric 100 to be located for sewing the next pattern line. Since the fabric 100 can be accurately located for sewing the next pattern line, high-quality pattern can be sewn.
Sewing machine
The present invention provides a sewing machine enabling to sew a high-quality pattern without using an embroidery frame. In a sewing machine 1, a pattern is sewn while a fabric 100 is fed in a sewing direction by a feed dog 2a. The sewing machine 1 has a fabric guide 14. The fabric guide 14 has a guide portion 16 which extends straight in a sewing direction to serve as a basis of a cloth feed in an amplitude direction of the needle. The carriage 10 makes the fabric guide 14 slide in the amplitude direction of the needle by a predetermined distance. Thus, the guide portion 16 serves as an index of the position of the fabric 100 to be located for sewing the next pattern line. Since the fabric 100 can be accurately located for sewing the next pattern line, high-quality pattern can be sewn.