A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.

An apparatus for processing yarns includes a first roller set for extending yarn beam; a node generator installed after the first roller set for forming node section of the yarn beam; a first cleaning chamber installed after the node generator for cleaning the yarn beams; a material chamber for adding additive to the yarn beam; a second roller set installed after the material chamber for extending the yarn beam; a first heating chamber installed after the second roller set for thermally setting additives to the yarn beam so that the additives are firmly secured to the yarn of the yarn beam; a third roller set installed after the heating chamber for controlling the heating time of the yarn beam in the first heating chamber; and a fourth roller set installed after the third roller set for winding the yarn beam to a desired shape.

A Schiff base compound configured to detoxify a toxic chemical agent. The toxic chemical agent includes at least one leaving group and the Schiff base compound includes an imine having at least one Lewis base and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced way from the electron acceptor by a distance that ranges from about 200 pm to about 1000 pm.

A Schiff base compound configured to detoxify a toxic chemical agent. The toxic chemical agent includes at least one leaving group and the Schiff base compound includes an imine having at least one Lewis base and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced way from the electron acceptor by a distance that ranges from about 200 pm to about 1000 pm.

Embodiments of the present disclosure pertain to conductive textiles that include a textile component with a plurality of fibers; and metal-organic frameworks associated with the fibers of the textile component in the form of a conductive network. Metal-organic frameworks may have a two-dimensional structure and a crystalline form. Metal-organic frameworks may be conformally coated on the fibers of the textile component. Additional embodiments of the present disclosure pertain to methods of sensing an analyte in a sample by exposing the sample to a conductive textile; and detecting the presence or absence of the analyte by detecting a change in a property of the conductive textile, and correlating the change in the property to the presence or absence of the analyte. The analyte in the sample may reversibly associate with the conductive textile. The association may also result in filtration, pre-concentration, and capture of the analyte by the conductive textile.

A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.

An apparatus for processing yarns includes a first roller set for extending yarn bean; a node generator installed after the first roller set for forming node section of the yarn beam; a first cleaning chamber installed after the node generator for cleaning the yarn beams; a material chamber for adding additive to the yarn beam; a second roller set installed after the material chamber for extending the yarn beam; a first heating chamber installed after the second roller set for thermally setting additives to the yarn beam so that the additives are firmly secured to the yarn of the yarn beam; a third roller set installed after the heating chamber for controlling the heating time of the yarn beam in the first heating chamber; and a fourth roller set installed after the third roller set for winding the yarn beam to a desired shape.

A method of using select Schiff base compounds for chemical agent detoxification. The method including applying a compound to the contaminated substrate. The compound includes an imine having at least one Schiff base nitrogen and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced away from the electron acceptor by a distance ranging from about 200 pm to about 1000 pm. The substrate and the compound are dried. The at least one Schiff base nitrogen of the compound promotes a nucleophilic attack on an electrophilic site of the toxic chemical agent.

A method of using select Schiff base compounds for chemical agent detoxification. The method including applying a compound to the contaminated substrate. The compound includes an imine having at least one Schiff base nitrogen and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced away from the electron acceptor by a distance ranging from about 200 pm to about 1000 pm. The substrate and the compound are dried. The at least one Schiff base nitrogen of the compound promotes a nucleophilic attack on an electrophilic site of the toxic chemical agent.

A water-based treatment agent of the present invention is a water-based treatment agent for producing a coating of a rubber-reinforcing member. The water-based treatment agent of the present invention includes: a rubber latex; and at least one selected from the group consisting of a compound A represented by the following formula (1) and a compound B represented by the following formula (2).

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