A rotating device and a vacuum pump are provided, having a structure in which a refrigerant or the like does not leak out to an inside and which can sufficiently cool a rotating body, obtain high reliability, and realize cost reduction. The structure is constituted to include: a casing; a rotating body including a rotating shaft disposed rotatably relative to the casing, the rotating body constituted integrally with the rotating shaft; a hollow part formed along a center of the rotating shaft in the rotating body; and a cooling rod which is fixed to the casing and provided in a state of non-contact with the rotating body in the hollow part without having a mechanism for injecting a refrigerant, and which absorbs a radiation heat of the rotating body to cool the rotating body.

A rotating device and a vacuum pump are provided, having a structure in which a refrigerant or the like does not leak out to an inside and which can sufficiently cool a rotating body, obtain high reliability, and realize cost reduction. The structure is constituted to include: a casing; a rotating body including a rotating shaft disposed rotatably relative to the casing, the rotating body constituted integrally with the rotating shaft; a hollow part formed along a center of the rotating shaft in the rotating body; and a cooling rod which is fixed to the casing and provided in a state of non-contact with the rotating body in the hollow part without having a mechanism for injecting a refrigerant, and which absorbs a radiation heat of the rotating body to cool the rotating body.

A vacuum pump and a stator column wherein partition walls from an outer peripheral surface of the stator column toward an inner periphery of a rotor blade are provided at two spots, and a groove-shaped channel in a circumferential direction is provided. A sectional area of the channel changes in the circumferential direction. As a result, the pressure difference between a front and a rear of the partition wall on a downstream side is made uniform regardless of a location, and a flowrate of the gas passing through a gap between the partition wall on the downstream side and the inner peripheral surface of the rotor blade is made uniform regardless of the location. The change in the sectional area is achieved either by changing a depth of the groove-shaped channel or by changing an interval between the partition walls at the two spots.

A vacuum pump and a stator column wherein partition walls from an outer peripheral surface of the stator column toward an inner periphery of a rotor blade are provided at two spots, and a groove-shaped channel in a circumferential direction is provided. A sectional area of the channel changes in the circumferential direction. As a result, the pressure difference between a front and a rear of the partition wall on a downstream side is made uniform regardless of a location, and a flowrate of the gas passing through a gap between the partition wall on the downstream side and the inner peripheral surface of the rotor blade is made uniform regardless of the location. The change in the sectional area is achieved either by changing a depth of the groove-shaped channel or by changing an interval between the partition walls at the two spots.

Provided is a vacuum pump regarding which compression can be improved at low costs.

Included is a plurality of Siegbahn exhaust mechanisms in which a helical groove is provided to a stator disc. The Siegbahn exhaust mechanisms are provided on both faces of an upstream side and a downstream side of the stator disc. An end portion of the helical groove provided on the upstream side and a start portion of the helical groove provided on the downstream side are situated at least partially overlapping in a circumferential direction. A width of a channel of a switchback portion of the upstream side and the downstream side is equivalent or less than a depth of a channel of the Siegbahn exhaust mechanisms.

A vacuum pump, vacuum pump set and method for evacuating a semiconductor processing chamber is disclosed. The vacuum pump is configured for mounting to a semiconductor processing chamber to evacuate the chamber to pressures between 1 mbar and 5×10.sup.−2 mbar. The vacuum pump comprises: a rotor rotatably mounted within a stator. The rotor comprises a plurality of angled blades arranged along a helical path from an inlet to an outlet. The stator comprises a plurality of perforated elements arranged to intersect the helical path, the perforations allowing gas molecules travelling along the helical path to pass through the perforated elements. The rotor mounted on a magnetically levitated bearing; and the perforated elements located towards an inlet of the vacuum pump comprise a transparency of more than 40% and the perforated elements located towards an outlet of the vacuum pump comprise a transparency of more than 30%.

A vacuum pump comprises: a pump main body; a heater provided at the pump main body; a power source device configured to supply power to the pump main body; a cooler provided between the pump main body and the power source device; a connection plate provided between the pump main body and the cooler; a first heat insulating plate arranged between the cooler and the connection plate; and a second heat insulating plate arranged between the pump main body and the connection plate.

A vacuum pump comprising: a rotor rotatably mounted within a stator; the rotor comprising a plurality of angled blades arranged along a helical path from an inlet to an outlet; the stator comprising a plurality of perforated elements forming a plurality of perforated discs arranged to intersect the helical path at different axial positions, the perforations allowing gas molecules travelling along the helical path to pass through the perforated elements. Each of the perforated discs comprises an outer curved wall forming an outer circumference of the disc and an inner curved wall forming a portion of an inner circumference of the disc, the inner circumference comprising at least one gap where there is no inner wall.

A vacuum pump is provided that can decompose by-products into particles using radicals and effectively discharge the particles to outside. The vacuum pump includes: an outer cylinder having an inlet port and an outlet port; a rotor shaft rotationally supported inside the outer cylinder; a rotating body including a plurality of rotor blades fixed to the rotor shaft and is rotatable together with the rotor shaft, the vacuum pump further including at least one radical supply port capable of supplying a plurality of types of radicals into the outer cylinder; and a radical supply means for supplying radicals to the radical supply port.

A vacuum pump is provided that can decompose by-products into particles using radicals and effectively discharge the particles to outside. The vacuum pump includes: an outer cylinder having an inlet port and an outlet port; a rotor shaft rotationally supported inside the outer cylinder; a rotating body including a plurality of rotor blades fixed to the rotor shaft and is rotatable together with the rotor shaft, the vacuum pump further including at least one radical supply port capable of supplying a plurality of types of radicals into the outer cylinder; and a radical supply means for supplying radicals to the radical supply port.