A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate,

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

A bearing assembly for stabilizing rotation of a rotatable element includes a gas bearing acting as a bearing for the rotatable element. An ultrasonic vibration pump is coupled to the gas bearing for providing pressurized gas to the gas bearing, and a sealed housing encloses the gas bearing and the ultrasonic vibration pump. Also described is a reaction wheel assembly for a spacecraft. The reaction wheel assembly includes a reaction wheel and the bearing assembly for stabilizing rotation of the reaction wheel.

Described is a measuring drive for a measuring instrument, in particular a rheometer. The measuring drive has: i) a motor, ii) a shaft, which is coupled to the motor in such a way that the shaft is drivable by the motor, and iii) an ultrasonic device, which is configured to provide ultrasound to the shaft in such a way that at least a part of the shaft is bearable substantially without contact by the ultrasound. Furthermore, the measuring instrument, a method, and a using are described.

Described is a measuring drive for a measuring instrument, in particular a rheometer. The measuring drive has: i) a motor, ii) a shaft, which is coupled to the motor in such a way that the shaft is drivable by the motor, and iii) an ultrasonic device, which is configured to provide ultrasound to the shaft in such a way that at least a part of the shaft is bearable substantially without contact by the ultrasound. Furthermore, the measuring instrument, a method, and a using are described.

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

A system for levitating a softened, viscous or viscoelastic material by near field acoustic levitation. The system includes a support structure having a rigid surface, and a vibration generator operatively connected to the rigid surface. The vibration generator transmits acoustic waves to the rigid surface at a frequency and an amplitude sufficient to vibrate the rigid surface and create a gas squeeze film between the material and the rigid surface. The gas squeeze film has a pressure greater than ambient air pressure and sufficient to levitate the material. The system is particularly suited for transporting, forming, or casting heated glass. Also disclosed are methods for transporting, forming, and casting heated glass using near field acoustic levitation.