A method for operating a rotary vessel which monitors the position of the tire relative to the upper and lower thrust bearings and the temperature of the upper and lower thrust bearings and provides an output that alerts an operator when corrective action should be taken.

Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber. The apparatus comprises a heater located within a chamber; a tray located near the heater within the chamber and spaced apart from the heater and used for carrying the base; a first temperature control unit coupled with a surface of the tray for carrying the base and used for measuring the temperature of the tray surface and outputting a first control signal as a function of a set temperature and the temperature of the tray surface; and a second temperature control unit connected to the first temperature control unit and used for measuring the temperature of the middle of the area between the tray and the heater, and also for outputting a second control signal as a function of the first control signal and the temperature of the middle, with the heater being coupled with the second temperature control unit to heat according to the second control signal. Further provided is a method for controlling the heating of the base within a chemical vapour deposition chamber. A steady base temperature can be obtained via the apparatus.

A vacuum heat treatment apparatus according to the embodiment comprises a chamber; a thermal insulator in the chamber; a reaction container in the thermal insulator; a heating member between the reaction container and the the thermal insulator for heating the reaction container; and a temperature measuring member in or on a surface of the reaction container, wherein the temperature measuring member comprises a thermocouple and a protective tube surrounding the thermocouple, and the protective tube comprises tungsten (W), tantalum (Ta), or silicon carbide (SiC).

An integrated sensor system for use in a furnace system including a furnace having at least one burner and two or more zones each differently affected by at least one furnace parameter regulating energy input into the furnace, including a first temperature sensor positioned to measure a first temperature in the furnace system, a second temperature sensor positioned to measure a second temperature in the furnace system; and a controller programmed to receive the first and second measured temperatures, and to adjust operation of a furnace system parameter based on a relationship between the first and second temperatures, thereby differentially regulating energy input into at least two of the zones of the furnace; wherein the relationship between the first and second temperatures is a function of one or more of a difference between the two temperatures, a ratio of the two temperatures, and a weighted average of the two temperatures.

Methods for operating an oven appliance, as provided herein, may include various steps for activating top and bottom heating elements (e.g., at overlapping times) prior to limiting activation of one of the heating elements based on one or more received temperature signals.

A flash lamp emits a flash of light to a front surface of a semiconductor wafer held in a chamber to heat the semiconductor wafer. A GCT thyristor is connected in parallel with the flash lamp. After a lapse of a predetermined time period since a current starts to flow through the flash lamp, the GCT thyristor enters an ON state. This allows a discharge current to flow through the GCT thyristor with a smaller impedance, and prevents any current from flowing through the flash lamp. Consequently, a tail current flowing through the flash lamp can be suppressed. Furthermore, reduction in a voltage charged into a capacitor can prevent the life of the flash lamp from being shortened.

A furnace monitoring system for monitoring a furnace over a span of time during furnace operation, including a thermal imaging apparatus, the apparatus is disposed outside of the furnace and at a distance from the exterior of the furnace to generate field signals of the furnace; a signal processing unit configured and programmed for receiving the field signals and generating a temperature map of the exterior of the furnace; and a means for displaying the temperature map locally or remotely. Wherein in that the furnace monitoring system is a system for monitoring the furnace over a span of time during furnace operation and in that the generated temperature map is divided into several zones, which correspond to different components of the furnace selected from burner, viewing port for burner observation, charging port, discharging port and flue gas channel.

A furnace for the heat treatment of a metal product includes constitutive elements, each having a thermal inertia property determined from physical parameters. The constitutive elements include walls delimiting at least partially the furnace, a heating unit for heating the metal product, and a rapid heating element for heating the metal product. The furnace also includes a control circuit for controlling the heating unit and/or the rapid heating element, based on one or more thermal inertia properties of one or more constitutive elements of the furnace, and at least based on a ground of a constitutive element of said furnace.

Real-time monitoring of a multi-zone vertical furnace with early detection of a failure of a heating zone element is disclosed. For example, a continuously provided measurement of a resistance value (R.sub.1) of a resistance (1) in at least one heating zone (1) of several heating zones (1, 2, 3, 4, 5) takes place in the thermal device (100), each currently measured value (R.sub.1(i)) of the resistance (1) in the related heating zone (1) is compared with a previously measured value (R.sub.1(i1)) of the same resistance (1), and a warning or an alarm (90) for the thermal device (100) is generated when a deviation (310, R.sub.1) is detected by a comparison of the two resistance values from the same heating zone (1) before a failure of a complete heating zone (1) in the thermal device (100) takes place.

A device for measuring distribution of thermal field in a crucible comprises a crucible comprising an upper lid, a body, a growth chamber and a material source zone; a thermally insulating material disposed outside the crucible; a movable heating component for heating the crucible; a plurality of thermocouples enclosed by insulating, high temperature resistant material and disposed in the crucible after being inserted into a plurality of holes on the upper lid to measure distribution of thermal field in the crucible. The thermocouples enclosed by insulating, high temperature resistant material are effective in measuring and adjusting temperature distribution in the crucible to achieve optimal temperature distribution for crystal growth in the crucible.