A device is configured to operate a Heating, Ventilation, and Air Conditioning (HVAC) system. The device is further configured to determine that the speed of a combustion air inducer exceeds a speed threshold value. The device is further configured to receive an audio signal from a microphone while operating the HVAC system and to determine an audio signature for the combustion air inducer is not present within the audio signal. The device is further configured to determine whether an audio signature for the integrated furnace controller is present within the audio signal. The device is further configured to determine a fault type based on the determination of whether the audio signature for the integrated furnace controller is present within the audio signal, to identify a component identifier for a component of the HVAC system that is associated with fault type, and to output a recommendation identifying the component identifier.

A device is configured to operate a Heating, Ventilation, and Air Conditioning (HVAC) system. The device is further configured to determine that the speed of a combustion air inducer exceeds a speed threshold value. The device is further configured to receive an audio signal from a microphone while operating the HVAC system and to determine an audio signature for the combustion air inducer is not present within the audio signal. The device is further configured to determine whether an audio signature for the integrated furnace controller is present within the audio signal. The device is further configured to determine a fault type based on the determination of whether the audio signature for the integrated furnace controller is present within the audio signal, to identify a component identifier for a component of the HVAC system that is associated with fault type, and to output a recommendation identifying the component identifier.

According to one aspect of a technique the present disclosure, there is provided a processing apparatus including: an apparatus controller including a memory storing apparatus data containing monitor data containing sensor information and an alarm indicating a failure detected based on the sensor information and an alarm analysis table containing analysis items. The apparatus controller is capable of outputting the alarm containing an alarm ID for specifying a type and an occurrence time of the alarm; specifying candidates of the analysis items from the alarm ID; acquiring monitor data corresponding to the candidates; determining a rank of the cause of the alarm according to a difference between monitor data at the occurrence time and a predetermined threshold value; and displaying a relationship between the monitor data and the threshold value. The display screen displays an occurrence history of the alarm and history of acquiring the monitor data.

According to one aspect of a technique the present disclosure, there is provided a processing apparatus including: an apparatus controller including a memory storing apparatus data containing monitor data containing sensor information and an alarm indicating a failure detected based on the sensor information and an alarm analysis table containing analysis items. The apparatus controller is capable of outputting the alarm containing an alarm ID for specifying a type and an occurrence time of the alarm; specifying candidates of the analysis items from the alarm ID; acquiring monitor data corresponding to the candidates; determining a rank of the cause of the alarm according to a difference between monitor data at the occurrence time and a predetermined threshold value; and displaying a relationship between the monitor data and the threshold value. The display screen displays an occurrence history of the alarm and history of acquiring the monitor data.

Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber. The apparatus comprises a heater located within a chamber; a tray located near the heater within the chamber and spaced apart from the heater and used for carrying the base; a first temperature control unit coupled with a surface of the tray for carrying the base and used for measuring the temperature of the tray surface and outputting a first control signal as a function of a set temperature and the temperature of the tray surface; and a second temperature control unit connected to the first temperature control unit and used for measuring the temperature of the middle of the area between the tray and the heater, and also for outputting a second control signal as a function of the first control signal and the temperature of the middle, with the heater being coupled with the second temperature control unit to heat according to the second control signal. Further provided is a method for controlling the heating of the base within a chemical vapour deposition chamber. A steady base temperature can be obtained via the apparatus.

Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber. The apparatus comprises a heater located within a chamber; a tray located near the heater within the chamber and spaced apart from the heater and used for carrying the base; a first temperature control unit coupled with a surface of the tray for carrying the base and used for measuring the temperature of the tray surface and outputting a first control signal as a function of a set temperature and the temperature of the tray surface; and a second temperature control unit connected to the first temperature control unit and used for measuring the temperature of the middle of the area between the tray and the heater, and also for outputting a second control signal as a function of the first control signal and the temperature of the middle, with the heater being coupled with the second temperature control unit to heat according to the second control signal. Further provided is a method for controlling the heating of the base within a chemical vapour deposition chamber. A steady base temperature can be obtained via the apparatus.

When using oxygen gas pipes 3, situations can arise, in particular due to slag return and similar dangers, in which the operator must initiate safety measures. Slag return safety devices are known which, in such a case, ensure that the gas flow is stopped by melting a cap 35 of a heat sensor 5. The response of this outlet valve 6 of the slag return safety device can be recognized, for example, by the fact that the inlet pressure of the existing oxygen gas 4 is used to push pins 21 located in the wall 19 of the oxygen gas pipe 3 beyond the outside 27 of the oxygen gas pipe 3, so that they cannot be overlooked as a warning signal. The movement of the pins 21 can be used to activate further signal systems 30 in order to provide additional indications of this movement optically and/or acoustically.

Disclosed herein is a monitoring system including a detecting device configured to detect at least one of smoke and heat, an alarm in operable communication with the detecting device, wherein the alarm is configured to notify a user after the detecting device detects at least one of smoke and heat, a sensing structure configured to determine whether a heating apparatus has a temperature that is above a threshold, and a processor in operable communication with the sensing structure and at least one of the detecting device and the alarm, the processor configured to at least one of turn off at least one of the alarm and the detecting device; and reduce the sensitivity of the detecting device, when the sensing structure determines that the heating apparatus has a temperature that is above a threshold.

Disclosed herein is a monitoring system including a detecting device configured to detect at least one of smoke and heat, an alarm in operable communication with the detecting device, wherein the alarm is configured to notify a user after the detecting device detects at least one of smoke and heat, a sensing structure configured to determine whether a heating apparatus has a temperature that is above a threshold, and a processor in operable communication with the sensing structure and at least one of the detecting device and the alarm, the processor configured to at least one of turn off at least one of the alarm and the detecting device; and reduce the sensitivity of the detecting device, when the sensing structure determines that the heating apparatus has a temperature that is above a threshold.

The invention relates to a dental furnace (10) for dental restorations comprising a firing chamber into which, in particular between a furnace bottom part (14) and a furnace upper part (12), the dental restoration, in particular within a muffle, can be introduced, and a sensor that is connected with a control device (52) for the dental furnace (10), characterized in that the sensor, in particular the temperature sensor (22), is arranged outside the firing chamber and comprises a detection range (40) that also extends outside the firing chamber.