A fluid container that can prevent a container from being in contact with a heat source fluid and stably hold the heat source fluid, even if corrosive, in the container to perform heat recovery and the like. A first fluid and a second fluid are both allowed to flow into and out of a container body 10. The second fluid is supplied into the container body by a second fluid supply unit 30 to form a layer of the second fluid flowing down along an inner surface of the container body 10, causing the second fluid to be interposed between the first fluid and the inner surface of the container body. This eliminates deterioration of the container body due to corrosion of the container body by the fact that the first fluid has contact with the inner surface of the container body, as well as scale precipitation from the first fluid.

A fluid container that can prevent a container from being in contact with a heat source fluid and stably hold the heat source fluid, even if corrosive, in the container to perform heat recovery and the like. A first fluid and a second fluid are both allowed to flow into and out of a container body 10. The second fluid is supplied into the container body by a second fluid supply unit 30 to form a layer of the second fluid flowing down along an inner surface of the container body 10, causing the second fluid to be interposed between the first fluid and the inner surface of the container body. This eliminates deterioration of the container body due to corrosion of the container body by the fact that the first fluid has contact with the inner surface of the container body, as well as scale precipitation from the first fluid.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

A compound having structural formula (II): where R.sup.2 is H, CH.sub.3, CF.sub.3, CH.sub.2CF.sub.2CF.sub.2H, or CH.sub.2CF.sub.2CF.sub.2CF.sub.2H; where R.sup.2f is a perfluoroalkyl group having 1-4 carbon atoms, optionally comprising either or both of a catenated nitrogen heteroatom and a catenated oxygen heteroatom; where R.sup.2f′ is CF.sub.3 or CF.sub.2CF.sub.3; and where R.sup.2f″ is CF.sub.3 or CF.sub.2CF.sub.3; with the proviso that when R.sup.2f′ is CF.sub.3, then R.sup.2f″ is CF.sub.3, and when R.sup.2 is H or CH.sub.3, then R.sup.2f is not CF.sub.3.

##STR00001##

A compound having structural formula (II): where R.sup.2 is H, CH.sub.3, CF.sub.3, CH.sub.2CF.sub.2CF.sub.2H, or CH.sub.2CF.sub.2CF.sub.2CF.sub.2H; where R.sup.2f is a perfluoroalkyl group having 1-4 carbon atoms, optionally comprising either or both of a catenated nitrogen heteroatom and a catenated oxygen heteroatom; where R.sup.2f′ is CF.sub.3 or CF.sub.2CF.sub.3; and where R.sup.2f″ is CF.sub.3 or CF.sub.2CF.sub.3; with the proviso that when R.sup.2f′ is CF.sub.3, then R.sup.2f″ is CF.sub.3, and when R.sup.2 is H or CH.sub.3, then R.sup.2f is not CF.sub.3.

##STR00001##

The invention relates to the nuclear energy field, including pressurized water reactor containment internal passive heat removal systems. The invention increases heat removal efficiency, flow stability in the circuit, and system reliability. The system has at least one cooling water circulation circuit comprising a heat exchanger inside the containment and including an upper and lower header interconnected by heat-exchange tubes, a riser pipeline and a downtake pipeline connected to the heat exchanger, a cooling water supply tank above the heat exchanger outside the containment and connected to the downtake pipeline, a steam relief valve connected to the riser pipeline and located in the water supply tank and hydraulically connected to the latter. The upper and lower header of the heat exchanger are divided into heat exchange tube sections on the assumption that: L/D≦20, L being the header section length, D being the header bore.

A system and method to generate steam from a feed water stream does so in a liquid pool zone of a vessel as the stream comes into contact with a heating medium that is less volatile than the feed water stream. To keep the pool hot, the heating medium can be recirculated through a heater of a pump-around loop or a heater can be placed in the liquid pool. As the feed water stream is vaporized or partially vaporized, any solids or unvaporized water present in the feed water stream come out of the stream and move into the heating medium. These solids and the unvaporized water may be further removed from the heating medium in the pool or in the pump-around loop. The heat exchange surface does not contact the feed water to generate steam.