Patent classifications
G01B9/02002
METHOD AND APPARATUS FOR DETERMINING A POSITION OF A RING WITHIN A PROCESS KIT
Examples disclosed herein are directed to a method and apparatus for determining a position of a ring within a process kit. In one example, a sensor assembly for a substrate processing chamber is provided. The sensor assembly includes a housing having a top surface, a bottom surface opposite the top surface, and a plurality of sidewalls connecting the top surface to the bottom surface. The housing also has a recess in the top surface, the recess forming an interior volume within the housing. The sensory assembly includes a bias member, and a contact member disposed on the bias member. The bias member and contact member are disposed within the recess. A sensor is configured to detect a displacement of the contact member. The displacement of the contact member corresponds to a relative position of an edge ring.
Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
LASER INTERFEROMETER
A laser interferometer that includes a light source configured to emit laser light, an optical divider configured to divide the laser light into a first optical path and a second optical path, an optical modulator being provided on the first optical path or the second optical path, including an oscillator that oscillates when a current is applied, and being configured to modulate the laser light by using the oscillator, a photoreceptor configured to receive the laser light and output a photoreception signal, the laser light being reflected by an object to be measured that is provided on the first optical path or the second optical path, and a demodulation circuit configured to demodulate, from the photoreception signal, a Doppler signal derived from the object to be measured, based on a reference signal and a modulation signal derived from the optical modulator, wherein Iq/f≤1×10.sup.−7 is satisfied, where an amplitude value of the current applied to the oscillator that is oscillating is Iq [A] and an oscillation frequency of the oscillator is f [Hz].
Wavelength Tracking System, Method to Calibrate a Wavelength Tracking System, Lithographic Apparatus, Method to Determine an Absolute Position of a Movable Object, and Interferometer System
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
Wavelength Tracking System, Method to Calibrate a Wavelength Tracking System, Lithographic Apparatus, Method to Determine an Absolute Position of a Movable Object, and Interferometer System
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
Laser Interferometer
A laser interferometer includes: a laser light source; a collimator configured to generate collimated light; an optical modulator configured to modulate the collimated light into reference light having a different frequency; and a light receiving element configured to receive object light and the reference light and output a light receiving signal, in which when an optical axis of the collimated light is a first optical axis, when return light is generated, an optical axis of the return light is a second optical axis, a position at which the collimated light is generated is a reference position, the following equation (A) is satisfied:
in which Δy is a shift width between the first optical axis and the second optical axis at the reference position, κ is an effective diameter of the collimator, R is a light diameter of the collimated light, L is a distance between the reference position and the optical modulator, and Λ is a wavelength of the collimated light.
Laser Interferometer
A laser interferometer includes: a laser light source; a collimator configured to generate collimated light; an optical modulator configured to modulate the collimated light into reference light having a different frequency; and a light receiving element configured to receive object light and the reference light and output a light receiving signal, in which when an optical axis of the collimated light is a first optical axis, when return light is generated, an optical axis of the return light is a second optical axis, a position at which the collimated light is generated is a reference position, the following equation (A) is satisfied:
in which Δy is a shift width between the first optical axis and the second optical axis at the reference position, κ is an effective diameter of the collimator, R is a light diameter of the collimated light, L is a distance between the reference position and the optical modulator, and Λ is a wavelength of the collimated light.
Laser Interferometer
A laser interferometer includes: a laser light source configured to emit laser light; a light shielding element having an opening through which the laser light passes; an optical modulator configured to modulate the laser light into reference light having a different frequency; and a light receiving element configured to receive object light generated by reflecting the laser light by an object to be measured and the reference light and output a light receiving signal. 0.10≤φ.sub.pin≤10.0, in which φ.sub.pin [mm] is a diameter of the opening.
Methods, systems and apparatus of interferometry for imaging and sensing
Various methods, systems and apparatus are provided for imaging and sensing using interferometry. In one example, a system includes an interferometer; a light source that can provide light to the interferometer at multiple wavelengths (λ.sub.i); and optical path delay (OPD) modifying optics that can enhance contrast in an interferometer output associated with a sample. The light can be directed to the sample by optics of the interferometer. The interferometer output can be captured by a detector (e.g., a camera) at each of the multiple wavelengths (λ.sub.i). In another example, an apparatus includes an add-on unit containing OPD that can enhance contrast in an interferometer output associated with a sample illuminated by light at a defined wavelength (λ.sub.i). A detector can be attached to the add-on unit to record the interferometer output at the defined wavelength (λ.sub.i).