A substrate processing system includes a chamber group including chambers configured to process a substrate in a desired process gas, a gas box group including gas boxes configured to supply the process gas to each of the chambers, a flow rate measuring device configured to measure a flow rate of the process gas supplied from the gas box group, and an exhaust device connected to the chamber group and the flow rate measuring device. The flow rate measuring device includes a measuring instrument and a measurement pipe connected to the gas box group and the measuring instrument and configured to flow the process gas through the gas box group and the measuring instrument. The measurement pipe includes branch pipes connected to each of the gas boxes, a main pipe connected to each of the branch pipes and the measuring instrument, and branch pipe valves provided in the branch pipes.

An electronic device manufacturing system includes: a gas supply; a mass flow controller (MFC) coupled to the gas supply; an inlet coupled to the MFC; an outlet; a control volume serially coupled to the inlet to receive a gas flow; and a flow restrictor serially coupled to the control volume and the outlet. A controller is adapted to allow the gas supply to flow gas through the control volume and the flow restrictor to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. A process chamber is coupled to a flow path, which is coupled to the mass flow controller, the process chamber to receive one or more process chemistries via the mass flow controller.

An electronic device manufacturing system includes: a gas supply; a mass flow controller (MFC) coupled to the gas supply; an inlet coupled to the MFC; an outlet; a control volume serially coupled to the inlet to receive a gas flow; and a flow restrictor serially coupled to the control volume and the outlet. A controller is adapted to allow the gas supply to flow gas through the control volume and the flow restrictor to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. A process chamber is coupled to a flow path, which is coupled to the mass flow controller, the process chamber to receive one or more process chemistries via the mass flow controller.

A system and method for metering fluid flow is disclosed which has improved diagnostic capabilities. As well as informing a flow meter operator of the presence of a malfunction and its likely cause, the new systems and methods can also quantify an associated flow prediction bias.

A system and method for metering fluid flow is disclosed which has improved diagnostic capabilities. As well as informing a flow meter operator of the presence of a malfunction and its likely cause, the new systems and methods can also quantify an associated flow prediction bias.

An airflow measurement device that is configured to measure airflow in an air handling system. The airflow measurement device can include a flow conditioning plate formed with a plurality of plate apertures or holes. A flow sensor is associated with each aperture. The flow sensors can be any type(s) of flow sensors that are suitable for sensing or characterizing one or more aspects of air flowing into and through the apertures, such as pitot sensors, vane anemometers, hot wire anemometers, or the like. The flow sensors can be used to quantify the volumetric airflow rate of the airflow, the speed of the airflow, or any other variable of the airflow from which one can formulate a judgment about the operating efficiency of the air handling equipment.

An airflow measurement device that is configured to measure airflow in an air handling system. The airflow measurement device can include a flow conditioning plate formed with a plurality of plate apertures or holes. A flow sensor is associated with each aperture. The flow sensors can be any type(s) of flow sensors that are suitable for sensing or characterizing one or more aspects of air flowing into and through the apertures, such as pitot sensors, vane anemometers, hot wire anemometers, or the like. The flow sensors can be used to quantify the volumetric airflow rate of the airflow, the speed of the airflow, or any other variable of the airflow from which one can formulate a judgment about the operating efficiency of the air handling equipment.

A multiphase flowmeter may include a circuit including a pressure sensor configured to determine pressure data associated with a fluid mixture flowing through a chamber. The circuit may include one or more position sensors configured to determine position data associated with a position of a movable element that is configured to move within the chamber in response to pressure of the fluid mixture. The circuit may include a processor to determine a flow rate of the fluid mixture based on the pressure data and the position data and first volumes of gas and liquid within the fluid mixture based on frequency data determined from the position data. The processor may be configured to determine second volumes of water and oil within the fluid mixture based on one or more of a cut sensor or a change in an electrical parameter of the one or more position or other sensors.

Disclosed herein are an apparatus and method fluid flow measurements which include a pressure transducer and a flexible tube. The pressure transducer is tuned to measure flow speeds having a Reynolds number less than 100 and include an inlet. The flexible tube has a first end fluidly coupled to the inlet and a second end positioned adjacent to and in fluid communication with a plurality of fluid outlets of a microchannel flow structure. Each of the plurality of fluid outlets has a cross section defining an outlet area. The second end has a cross section defining a flexible tube area that is larger than the outlet area.

Systems, devices, and methods are provided for measuring fluid flow across a pump used in a system for precisely and accurately metering fluid. The systems, devices, and methods can use contactless approaches to measure the properties of the fluid being pumped. The measured properties can be used to precisely and accurately determine the flow rate through the pump.