The flow rate measuring method is performed in a common gas supply system comprising a plurality of gas supply paths each having a first valve, and a gas measuring device formed downstream side of the plurality of gas supply paths, having a pressure sensor, a temperature sensor, and a downstream side second valve. The flow rate measuring method includes: a first step of opening any one of the first valves and the second valve to allow gas to flow, closing the second valve while gas is flowing, and closing the first valve after a predetermined time has elapsed, and then measuring a pressure and a temperature after the first valve has been closed; a second step of opening any one of first valves and the second valve to allow gas to flow, closing the any one of the first valve and the second valve at the same time while gas is flowing, and then measuring a pressure and temperature after the first valve and the second valve have been closed; and a third step of calculating the flow rate in accordance with the pressure and temperature measured in the first step and the pressure and temperature measured in the second step.

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

Systems and methods for liquid removal to increase the accuracy of gas flow meters, such as venturi meters. Systems and methods include a liquid knockout drum, an impingement plate, a drum separator, and a check valve.

The present invention concerns the technical field of volumetric measurement and volumetric instruments and provides novel devices and methods for the determination of the volume of a fluid.

The present invention concerns the technical field of volumetric measurement and volumetric instruments and provides novel devices and methods for the determination of the volume of a fluid.

A gas supply system capable of flow measurement includes a flow controller that controls the flow rate of a flowing gas, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage that branches from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensing device that detects a pressure in a flow passage controlled by the first, second, and third shutoff valves, a temperature sensing device that detects a temperature in the flow passage controlled by the first, second, and third shutoff valves, a volume measuring tank connected downstream of the third shutoff valve and having a known volume, and an arithmetic and control unit that obtains a passage volume controlled by the first, second, and third shutoff valves by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate of the flow controller, using the passage volume and detection values obtained by the pressure sensing device and the temperature sensing device.

A gas supply system capable of flow measurement includes a flow controller that controls the flow rate of a flowing gas, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage that branches from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensing device that detects a pressure in a flow passage controlled by the first, second, and third shutoff valves, a temperature sensing device that detects a temperature in the flow passage controlled by the first, second, and third shutoff valves, a volume measuring tank connected downstream of the third shutoff valve and having a known volume, and an arithmetic and control unit that obtains a passage volume controlled by the first, second, and third shutoff valves by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate of the flow controller, using the passage volume and detection values obtained by the pressure sensing device and the temperature sensing device.

The flow rate measuring method is performed in a common gas supply system comprising a plurality of gas supply paths each having a first valve, and a gas measuring device formed downstream side of the plurality of gas supply paths, having a pressure sensor, a temperature sensor, and a downstream side second valve. The flow rate measuring method includes: a first step of opening any one of the first valves and the second valve to allow gas to flow, closing the second valve while gas is flowing, and closing the first valve after a predetermined time has elapsed, and then measuring a pressure and a temperature after the first valve has been closed; a second step of opening any one of first valves and the second valve to allow gas to flow, closing the any one of the first valve and the second valve at the same time while gas is flowing, and then measuring a pressure and temperature after the first valve and the second valve have been closed; and a third step of calculating the flow rate in accordance with the pressure and temperature measured in the first step and the pressure and temperature measured in the second step.

The flow rate measuring method is performed in a common gas supply system comprising a plurality of gas supply paths each having a first valve, and a gas measuring device formed downstream side of the plurality of gas supply paths, having a pressure sensor, a temperature sensor, and a downstream side second valve. The flow rate measuring method includes: a first step of opening any one of the first valves and the second valve to allow gas to flow, closing the second valve while gas is flowing, and closing the first valve after a predetermined time has elapsed, and then measuring a pressure and a temperature after the first valve has been closed; a second step of opening any one of first valves and the second valve to allow gas to flow, closing the any one of the first valve and the second valve at the same time while gas is flowing, and then measuring a pressure and temperature after the first valve and the second valve have been closed; and a third step of calculating the flow rate in accordance with the pressure and temperature measured in the first step and the pressure and temperature measured in the second step.