The present disclosure relates to a sitting toilet type uroflowmeter apparatus. The sitting toilet type uroflowmeter apparatus according to the present disclosure includes a toilet main body having a water collecting tank; a seat part that is positioned above the toilet main body and that is rotatable; and a uroflow sensor that is positioned on a bottom surface of the water collecting tank and that measures a flux over time.

The present disclosure relates to a sitting toilet type uroflowmeter apparatus. The sitting toilet type uroflowmeter apparatus according to the present disclosure includes a toilet main body having a water collecting tank; a seat part that is positioned above the toilet main body and that is rotatable; and a uroflow sensor that is positioned on a bottom surface of the water collecting tank and that measures a flux over time.

A fluid flow simulation device may include a heating chamber configured to heat a conductive fluid with one or more electrodes. The fluid flow simulation device may also include a heat exchanger positioned over the heating chamber and a downcomer coupled between an outlet of the heat exchanger and a bottom of the heating chamber.

A fluid flow simulation device may include a heating chamber configured to heat a conductive fluid with one or more electrodes. The fluid flow simulation device may also include a heat exchanger positioned over the heating chamber and a downcomer coupled between an outlet of the heat exchanger and a bottom of the heating chamber.

In some examples, an instrument for measuring a volume of a liquid is provided. A gas flow rate sensor may measure a rate of flow of a pressurized gas to a reservoir storing a liquid. A controller may be coupled to the gas flow rate sensor and may calculate a volume of the liquid that the flow of pressurized gas displaces from the reservoir. In some examples, a method of measuring a volume of a liquid is provided. Using a gas flow rate sensor, a flow of pressurized gas may be measured. The flow of the pressurized gas may be delivered to a reservoir storing a liquid. A volume of the liquid in the reservoir may be displaced using the flow of pressurized gas. The measurement of the flow of the pressurized gas may be used to calculate the volume of the liquid that is displaced.

In some examples, an instrument for measuring a volume of a liquid is provided. A gas flow rate sensor may measure a rate of flow of a pressurized gas to a reservoir storing a liquid. A controller may be coupled to the gas flow rate sensor and may calculate a volume of the liquid that the flow of pressurized gas displaces from the reservoir. In some examples, a method of measuring a volume of a liquid is provided. Using a gas flow rate sensor, a flow of pressurized gas may be measured. The flow of the pressurized gas may be delivered to a reservoir storing a liquid. A volume of the liquid in the reservoir may be displaced using the flow of pressurized gas. The measurement of the flow of the pressurized gas may be used to calculate the volume of the liquid that is displaced.

The present invention provides a system for measuring instantaneous inflow rate of liquid, comprising: a receptacle, comprising an opening at a top side, a nozzle at a bottom and/or multiple holes on the side section of said receptacle configured to receive the inflow of liquid from said top opening, and simultaneously release said liquid through said nozzles; a sensing device, configured to sense the level of liquid within the receptacle and produce signals indicative of the level of liquid in the receptacle; and a processor, configured to receive said signals, calculate the level of liquid in the receptacle according to said signals; and analyze said calculations, to obtain the instantaneous inflow rate of liquid.

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

The flow rate measuring method is performed in a common gas supply system comprising a plurality of gas supply paths each having a first valve, and a gas measuring device formed downstream side of the plurality of gas supply paths, having a pressure sensor, a temperature sensor, and a downstream side second valve. The flow rate measuring method includes: a first step of opening any one of the first valves and the second valve to allow gas to flow, closing the second valve while gas is flowing, and closing the first valve after a predetermined time has elapsed, and then measuring a pressure and a temperature after the first valve has been closed; a second step of opening any one of first valves and the second valve to allow gas to flow, closing the any one of the first valve and the second valve at the same time while gas is flowing, and then measuring a pressure and temperature after the first valve and the second valve have been closed; and a third step of calculating the flow rate in accordance with the pressure and temperature measured in the first step and the pressure and temperature measured in the second step.