Patent classifications
G01J1/10
Apparatus and method for quantitative characterization of a light detector
Aspects of the present disclosure include methods for determining a parameter of a photodetector (e.g., a photodetector in a particle analyzer). Methods according to certain embodiments include irradiating a photodetector positioned in a particle analyzer with a light source (e.g., a continuous wave light source) at a first intensity for a first predetermined time interval, irradiating the photodetector with the light source at a second intensity for a second predetermined time interval, integrating data signals from the photodetector over a period of time that includes the first predetermined interval and the second predetermined interval and determining one or more parameters of the photodetector based on the integrated data signals. Systems (e.g., particle analyzers) having light source and a photodetector for practicing the subject methods are also described. Non-transitory computer readable storage medium having instructions stored thereon for determining a parameter of a photodetector according to the subject methods are also provided.
Apparatus and Method for Quantitative Characterization of a Light Detector
Aspects of the present disclosure include methods for determining a parameter of a photodetector (e.g., a photodetector in a particle analyzer). Methods according to certain embodiments include irradiating a photodetector positioned in a particle analyzer with a light source (e.g., a continuous wave light source) at a first intensity for a first predetermined time interval, irradiating the photodetector with the light source at a second intensity for a second predetermined time interval, integrating data signals from the photodetector over a period of time that includes the first predetermined interval and the second predetermined interval and determining one or more parameters of the photodetector based on the integrated data signals. Systems (e.g., particle analyzers) having light source and a photodetector for practicing the subject methods are also described. Non-transitory computer readable storage medium having instructions stored thereon for determining a parameter of a photodetector according to the subject methods are also provided.
Multi-layered target design
Multi-layered targets, design files and design and production methods thereof are provided. The multi-layered targets comprise process layers arranged to have parallel segmentation features at specified regions, and target layer comprising target elements which are perpendicular to the parallel segmentation features of the process layers at the specified regions.
Laser fabrication with beam detection
A computer numerically controlled machine may include a source of electromagnetic energy. A beam of electromagnetic energy from the source may be delivered to a destination such as, for example, a material positioned in a working area of the computer numerically controlled machine. The beam of electromagnetic energy may be susceptible to interferences while traveling from the source to the destination. The computer numerically controlled machine may include a beam detector configured detect an interference of the beam by measuring a power of the beam of electromagnetic energy at a location between the source and the destination. An interference of the beam may be detected if the power of the beam is less than a threshold value. A controller at the computer numerically controlled machine may perform one or more actions in response to the beam detector detecting the interference of the beam of electromagnetic energy.
LIGHT RADIATION MEASUREMENT METHOD BASED ON LIGHT FILTERING UNIT AND APPARATUS THEREOF
The present invitation relates to an optical radiation measurement method based on light filter units, comprising the steps of: 1) providing characteristic filter units and correction light filter units in front of detection units to obtain multiple measured response values of an object to be detected; and, 2) selecting one or more sampling regions within a waveband to be detected, and calculating, according to a corresponding simultaneous expression/equation system of the measured response values, a spectral power distribution within the waveband to be detected. In this method, by introducing a small number of correction light filter units, the spectral power distribution within the entire waveband to be detected can be obtained without using a large number of narrow waveband color filters. In addition, a light radiation measurement apparatus is disclosed.
LIGHT RADIATION MEASUREMENT METHOD BASED ON LIGHT FILTERING UNIT AND APPARATUS THEREOF
The present invitation relates to an optical radiation measurement method based on light filter units, comprising the steps of: 1) providing characteristic filter units and correction light filter units in front of detection units to obtain multiple measured response values of an object to be detected; and, 2) selecting one or more sampling regions within a waveband to be detected, and calculating, according to a corresponding simultaneous expression/equation system of the measured response values, a spectral power distribution within the waveband to be detected. In this method, by introducing a small number of correction light filter units, the spectral power distribution within the entire waveband to be detected can be obtained without using a large number of narrow waveband color filters. In addition, a light radiation measurement apparatus is disclosed.
Semiconductor light detection device and method of detecting light of specific wavelength
Provided is a semiconductor light detection device having a relatively high detection sensitivity to a light component of a specific wavelength. The semiconductor light detection device includes: a semiconductor light receiving element, in which a first conductive layer is formed on a surface of a semiconductor substrate, a second conductive layer is formed below the first conductive layer, a third conductive layer is formed below the second conductive layer, and a photocurrent based on the intensity of incident light is output from the third conductive layer while an input voltage is applied to the first conductive layer; and a semiconductor detection circuit configured to output an output voltage based on a current difference between a first photocurrent and a second photocurrent being output in response to the application of the first input voltage and the second input voltage, respectively.
Apparatus and method for quantitative characterization of a light detector
Aspects of the present disclosure include methods for determining a parameter of a photodetector (e.g., a photodetector in a particle analyzer). Methods according to certain embodiments include irradiating a photodetector positioned in a particle analyzer with a light source (e.g., a continuous wave light source) at a first intensity for a first predetermined time interval, irradiating the photodetector with the light source at a second intensity for a second predetermined time interval, integrating data signals from the photodetector over a period of time that includes the first predetermined interval and the second predetermined interval and determining one or more parameters of the photodetector based on the integrated data signals. Systems (e.g., particle analyzers) having light source and a photodetector for practicing the subject methods are also described. Non-transitory computer readable storage medium having instructions stored thereon for determining a parameter of a photodetector according to the subject methods are also provided.
Laser fabrication with beam detection
A computer numerically controlled machine may include a source of electromagnetic energy. A beam of electromagnetic energy from the source may be delivered to a destination such as, for example, a material positioned in a working area of the computer numerically controlled machine. The beam of electromagnetic energy may be susceptible to interferences while traveling from the source to the destination. The computer numerically controlled machine may include a beam detector configured detect an interference of the beam by measuring a power of the beam of electromagnetic energy at a location between the source and the destination. An interference of the beam may be detected if the power of the beam is less than a threshold value. A controller at the computer numerically controlled machine may perform one or more actions in response to the beam detector detecting the interference of the beam of electromagnetic energy.
LASER FABRICATION WITH BEAM DETECTION
A computer numerically controlled machine may include a source of electromagnetic energy. A beam of electromagnetic energy from the source may be delivered to a destination such as, for example, a material positioned in a working area of the computer numerically controlled machine. The beam of electromagnetic energy may be susceptible to interferences while traveling from the source to the destination. The computer numerically controlled machine may include a beam detector configured detect an interference of the beam by measuring a power of the beam of electromagnetic energy at a location between the source and the destination. An interference of the beam may be detected if the power of the beam is less than a threshold value. A controller at the computer numerically controlled machine may perform one or more actions in response to the beam detector detecting the interference of the beam of electromagnetic energy.