An apparatus measures the transverse profile of vectorial optical field beams, including both the phase and the polarization spatial profile. The apparatus contains a polarization separation module, a weak perturbation module, and a detection module. Characterizing the transverse profile of vector fields provides an optical metrology tool for both fundamental studies of vectorial optical fields and a wide spectrum of applications, including microscopy, surveillance, imaging, communication, material processing, and laser trapping.

The interferometer 10 according to this disclosure includes: a first optical component 12 that splits each of the P polarization component and the S polarization component of the light to be measured into the first optical path R1 and the second optical path R2 and combines the light to be measured; a second optical component 13 placed in the first optical path; a third optical component 14 that splits the light to be measured into the P polarization component and the S polarization component; and a P polarization detector 11a and an S polarization detector 11b that respectively detect the P polarization component and the S polarization component split by the third optical component, wherein the second optical component has an optical surface that changes the propagation direction of the light to be measured and gives a phase difference between the P polarization component and the S polarization component.

A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.

A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.