Patent classifications
G01J4/02
REFLECTIVE POLARIZED LIGHT SEPARATION AND DIFFRACTION ELEMENT AND OPTICAL MEASUREMENT DEVICE COMPRISING SAME
The present invention provides a reflective polarized-light separating diffraction-element usable in a wide wavelength region including an ultraviolet region, and an optical measurement device comprising the same. The reflective polarized-light separating diffraction-element comprises: a substrate (1); a reflection surface (2) formed on a surface of the substrate (1); and a lattice structured body assembly (3) that is provided on the reflection surface (2) and shows a form birefringence (Δn*). The lattice structured body assembly (3) consists of lattice structured bodies (3A, 3B, 3C and 3D) of four patterns having lattice structures of different azimuths. The lattice structured bodies (3A, 3B, 3C and 3D) of a plurality of patterns are aligned on the reflection surface 2 in a predetermined direction such that the azimuths of the lattice structures change in a structurally periodic manner.
Imaging spectropolarimeter
An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors.
Imaging spectropolarimeter
An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors.
Systems and Methods for Infrared Sensing
The present disclosure relates to systems, vehicles, and methods relating to imaging and object detection using polarization-based detection of infrared light. An example system includes at least one infrared detector configured to detect infrared light corresponding to a target object within a field of view. The infrared light includes at least one of a first polarization or a second polarization. The system also includes a controller configured to carry out operations. The operations include receiving, from the at least one infrared detector, information indicative of infrared light corresponding to the target object. The operations also include determining, based on the received information, a polarization ratio corresponding to the target object. The polarization ratio comprises a first polarization intensity divided by a second polarization intensity. The operations also include determining, based on the polarization ratio, that the infrared light corresponding to the target object comprises direct light or reflected light.
POLARIZATION MEASURING DEVICE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Provided is a polarization measuring device including a stage on which a measurement target is provided, a light source assembly configured to emit incident light, a first polarimeter configured to polarize the incident light, a second polarimeter configured to polarize reflected light reflected from the measurement target that is irradiated by the incident light, a filter assembly configured to remove noise from the reflected light, and a detector configured to receive the reflected light and measure an intensity of the reflected light and a phase of the reflected light.
POLARIZATION MEASURING DEVICE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Provided is a polarization measuring device including a stage on which a measurement target is provided, a light source assembly configured to emit incident light, a first polarimeter configured to polarize the incident light, a second polarimeter configured to polarize reflected light reflected from the measurement target that is irradiated by the incident light, a filter assembly configured to remove noise from the reflected light, and a detector configured to receive the reflected light and measure an intensity of the reflected light and a phase of the reflected light.
Ellipsometer
An ellipsometer includes a first separation unit configured to separate a first reflected light into two reflected lights, a first polarizing optical element configured to separate each of the two reflected lights into two linearly polarized lights, a first interference device configured to form an interference fringe by allowing components of the two linearly polarized lights to interfere with each other, a second separation unit configured to separate a second reflected light into two reflected lights, a second polarizing optical element configured to separate each of the two reflected lights into two linearly polarized lights, and a second interference device configured to form an interference fringe by allowing components of the two linearly polarized lights to interfere with each other.
CAVITY ENHANCED POLARIMETER AND RELATED METHODS
A polarimeter for measuring chirality of a material comprising an optical ring cavity comprising a plurality of reflective elements configured to promote bi-directional propagation of a laser beam within the cavity, a laser-emitting device configured to introduce a first input beam and a second input beam into the cavity, a Faraday rotator, a phase compensator, an acousto-optic modulator configured to shift the frequency of the first output beam, an optical recombination device configured to recombine shifted and unshifted output beams, and first and second detectors configured to receive the recombined beams, wherein the plurality of reflective elements, Faraday rotator, and phase compensator are configured such that light from the first and second input beams passes through a chiral material located within the cavity a sufficient number of times for a measurement of optical rotary dispersion and circular dichroism of light transmitted through the material to be obtained at the detectors.
Apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry
In the embodiment in association with the present disclosure, an apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry are provided which allow simultaneously obtaining the absolute reflectance and phase data of a measurement object over a broad wavelength range and wide incident angle according to various polarization states by a single-shot measurement.
Vortex polarimeter
An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam. The metrology device focuses the vortex beam on a sample under test over a large range of angles of incidence. The metrology device may detect an image of the vortex beam reflected from the sample and measure the polarization state of the return light as function of the angle of incidence and the azimuth angle, which may be further measured at a plurality of different wavelengths. The vortex beam includes azimuthally varying polarization states, thereby enabling measurement of all desired polarization states without requiring the use of moving optical components. The polarization state information detected over multiple angles of incidence and wavelengths provides data with which an accurate determination of one or more characteristics of a sample may be determined.