A condition monitoring device for monitoring machinery includes a combination of on-board sensors and a condition monitoring module. The on-board sensors include modules for non-contact temperature, magnetic flux and 3-axis vibration sensing of the machinery. The condition monitoring module provides a condition monitoring signal containing information about an operating condition of the machinery, based upon a data synthesis condition monitoring technique that synthesizes non-contact temperature, magnetic flux and 3-axis vibration sensed data received from the combination of on-board sensors, determines a current operating condition of the machinery, and compares the current operating condition and the baseline operating condition of the machinery.

A thermal testing system includes a mirror array, having tiltable mirror elements, that reflects thermal radiation output from a radiative heat source. The mirror elements can be tilted as required to achieve a desired radiative heating profile, for example on an object to be tested. The thermal testing system may also have additional mirror arrays, and/or a heat sink. The radiative heat source may be stationary, and may have different zones (for example with different bulbs) that may be controlled separately, for example by having separate illumination intensity control for the different zones. The testing system may be configured for different tests, and/or to provide time-varying heating profiles.

A thermal testing system includes a mirror array, having tiltable mirror elements, that reflects thermal radiation output from a radiative heat source. The mirror elements can be tilted as required to achieve a desired radiative heating profile, for example on an object to be tested. The thermal testing system may also have additional mirror arrays, and/or a heat sink. The radiative heat source may be stationary, and may have different zones (for example with different bulbs) that may be controlled separately, for example by having separate illumination intensity control for the different zones. The testing system may be configured for different tests, and/or to provide time-varying heating profiles.

Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.

A temperature measurement system configured to measure a temperature of a target object having a first main surface and a second main surface includes a light source unit configured to emit output light penetrating the target object and including a first wavelength range and a second wavelength range; a measurement unit configured to measure a spectrum of reflected light; an optical path length ratio calculator configured to calculate an optical path length ratio between the output light of the first wavelength range and the output light of the second wavelength range; and a temperature calculator configured to calculate the temperature of the target object based on the optical path length ratio and a previously investigated relationship between the temperature of the target object and a refractive index ratio between the output light of the first wavelength range and the output light of the second wavelength range.

A temperature measurement system configured to measure a temperature of a target object having a first main surface and a second main surface includes a light source unit configured to emit output light penetrating the target object and including a first wavelength range and a second wavelength range; a measurement unit configured to measure a spectrum of reflected light; an optical path length ratio calculator configured to calculate an optical path length ratio between the output light of the first wavelength range and the output light of the second wavelength range; and a temperature calculator configured to calculate the temperature of the target object based on the optical path length ratio and a previously investigated relationship between the temperature of the target object and a refractive index ratio between the output light of the first wavelength range and the output light of the second wavelength range.

A measuring apparatus that performs measurement of position and posture of an object, the apparatus comprising: a measuring head for performing the measurement; a detector configured to detect a temperature; and a processor configured to output information of an offset amount of a position of the measuring head, based on the detected temperature.

Apparatuses and methods for measuring substrate temperature are provided. In one or more embodiments, an apparatus for estimating a temperature is provided and includes a plurality of electromagnetic radiation sources positioned to emit electromagnetic radiation toward a reflection plane, and a plurality of electromagnetic radiation detectors. Each electromagnetic radiation detector is positioned to sample the electromagnetic radiation emitted by a corresponding electromagnetic radiation source of the plurality of electromagnetic radiation sources. The apparatus also includes a pyrometer positioned to receive electromagnetic radiation emitted by plurality of electromagnetic radiation sources and reflected from a substrate disposed at a reflection plane and electromagnetic radiation emitted by the substrate. The apparatus includes a processor configured to estimate a temperature of the substrate based on the electromagnetic radiation emitted by the substrate. Methods of estimating temperature are also provided.

Disclosed is a temperature distribution measuring device for measuring the temperature distribution or the heat generation distribution in a sample. An embodiment collects a reflection signal the reflectivity of which changes on the basis of a bias signal applied to a sample, detects a signal of interest, which has been reflected from a region of interest in the sample, from the reflected signal, converts the signal of interest to a frequency range signal, calculates the relative amount of change in reflectivity of the sample by using a direct current component extracted on the basis of filtering of the frequency range signal and a frequency component of the bias signal, and acquires a thermal image of the sample on the basis of the relative amount of change in reflectivity.

The present invention pertains to a device for measuring a temperature distribution, which can measure a temperature distribution without contacting a minor sample having a three-dimensional structure. More particularly, the device for measuring the temperature distribution can measure a three-dimensional temperature distribution for a sample, wherein the temperature distribution in a depth direction (direction z) of the sample is measured by a thermo-reflectance technique using a chromatic dispersion lens, a diffraction spectrometer and an optical detection array; and the temperature distribution in parallel directions (direction x-y axes) of the sample is measured by the thermo-reflectance technique using a biaxial scanning mirror.