The present invention concerns a device for controlling the radiotherapy treatment of cancer patients, comprising a gas chamber (10) with flat and parallel electrodes (7), placed at a certain distance (d), a window (2) placed above an electrode (7) and insulating means (4, 5, 6) placed below the electrode (7). The chamber (10) is connected to a collector (8) through which a noble gas is introduced into a cavity (11) of the chamber (10), so that the electric field inside the chamber (10) is due to the polarisation of the chamber (10) and to the charges generated by the radiation pulse. The invention also concerns the related control method.

The present invention concerns a device for controlling the radiotherapy treatment of cancer patients, comprising a gas chamber (10) with flat and parallel electrodes (7), placed at a certain distance (d), a window (2) placed above an electrode (7) and insulating means (4, 5, 6) placed below the electrode (7). The chamber (10) is connected to a collector (8) through which a noble gas is introduced into a cavity (11) of the chamber (10), so that the electric field inside the chamber (10) is due to the polarisation of the chamber (10) and to the charges generated by the radiation pulse. The invention also concerns the related control method.

The disclosure describes various aspects of a cryogenic trapped-ion system. In an aspect, a method is described that includes bringing a chain of ions in a trap at a cryogenic temperature, the trap being a micro-fabricated trap, and performing quantum computations, simulations, or both using the chain of ions in the trap at the cryogenic temperature. In another aspect, a method is described that includes establishing a zig-zag ion chain in the cryogenic trapped-ion system, detecting a change in a configuration of the zig-zag ion chain, and determining a measurement of the pressure based on the detection in the change in configuration. In another aspect, a method is described that includes measuring a low frequency vibration, generating a control signal based on the measurement to adjust one or more optical components, and controlling the one or more optical components using the control signal.

A cold cathode ionization gauge includes multiple cathodes providing different spacings between the cathodes and an anode. The multiple cathodes allow for pressure measurements over wider ranges of pressure. A first cathode with a larger spacing may provide current based on Townsend discharge; whereas, a second cathode having a smaller spacing may provide current based on both Townsend discharge at higher pressures and on Paschen's Law discharge at still higher pressures. A feature on the second cathode may support Paschen's Law discharge. Large resistances between the cathodes and a return to power supply enable control of output profiles to extend the pressure ranges with accurate responses and avoid output minima. Pressure measurements may be made based on currents from respective cathodes dependent on the outputs of the cathodes through the wide pressure range of measurement. The multiple cathodes may also provide measurements that avoid the discontinuities found in current outputs of the respective cathodes.

The device for the impedance-based probing of materials described herein comprises a two-dimensional array of coils (1) and a measurement unit (4) adapted to determine, for each coil (1), a parameter indicative of its impedance. A pulse generator (3) is able to generate current pulses in each coil (1). The circuitry drives and senses the coil array through row and column lines (rp1 . . . rpN1, cp1 . . . cpN2, c21 . . . csN2) in order to minimize the number of required components. The device can, in particular, be used for probing concrete.

A plasma processing method includes forming plasma in a processing chamber; and performing etching to a film to be processed of a film structure that has previously been disposed on an upper surface of a wafer that includes a plurality of film layers. The film structure includes: a lower film including at least one film layer and a groove structure; and an upper film including at least one film layer that covers an inside and an upper end of the groove structure. The plasma processing method includes: removing the upper film by etching until an upper end of the groove structure of the lower film is exposed; performing etching to a film layer of the upper film inside the groove structure; and determining an end point by using a value of thickness of the film layer inside the groove structure of the lower film upon completion of the removing.

In the present invention, a pressure measurement device for determining the vacuum level within the evacuated housing of a vacuum electrode device is provided that includes an electrically conductive enclosure secured to an interior surface of the housing, an electrically conductive electrode extending through an aperture in the housing, the electrode having a tip at one end positioned within the interior of the housing inside the enclosure to define a gap between the tip and the enclosure and a conductive lead at a second end disposed outside of the housing, and a voltage source connected to the conductive lead to supply a voltage potential to the tip of the electrode. A voltage difference produced between the electrode and the enclosure ionizes gas within the enclosure causing a measurable current to flow between the electrode and the enclosure which can be used to determine the vacuum level in the housing.

In the present invention, a pressure measurement device for determining the vacuum level within the evacuated housing of a vacuum electrode device is provided that includes an electrically conductive enclosure secured to an interior surface of the housing, an electrically conductive electrode extending through an aperture in the housing, the electrode having a tip at one end positioned within the interior of the housing inside the enclosure to define a gap between the tip and the enclosure and a conductive lead at a second end disposed outside of the housing, and a voltage source connected to the conductive lead to supply a voltage potential to the tip of the electrode. A voltage difference produced between the electrode and the enclosure ionizes gas within the enclosure causing a measurable current to flow between the electrode and the enclosure which can be used to determine the vacuum level in the housing.

A vacuum pressure gauge is described herein. One apparatus includes an ion trap configured to trap antimatter therein in a vacuum chamber, and a controller configured to determine a lifetime of the antimatter trapped in the ion trap and determine a pressure in the vacuum chamber based, at least in part, on the determined lifetime of the antimatter.

A vacuum pressure gauge is described herein. One apparatus includes an ion trap configured to trap antimatter therein in a vacuum chamber, and a controller configured to determine a lifetime of the antimatter trapped in the ion trap and determine a pressure in the vacuum chamber based, at least in part, on the determined lifetime of the antimatter.